Influence of oxygen flow on crystallization and morphology of LiNbO 3 thin films

dc.contributorUniversidade Estadual Paulista (Unesp)
dc.contributorSwiss Federal Institute of Technology
dc.date.accessioned2014-05-27T11:20:23Z
dc.date.accessioned2022-10-05T17:45:30Z
dc.date.available2014-05-27T11:20:23Z
dc.date.available2022-10-05T17:45:30Z
dc.date.created2014-05-27T11:20:23Z
dc.date.issued2002-01-01
dc.identifierFerroelectrics, v. 271, p. 33-38.
dc.identifier0015-0193
dc.identifier1563-5112
dc.identifierhttp://hdl.handle.net/11449/66761
dc.identifier10.1080/00150190211491
dc.identifier2-s2.0-0141943464
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/3916485
dc.description.abstractPolymeric precursor solution (Pechini method) was used to deposit LiNbO 3 thin films by spin-coating on (100) silicon substrates. X-ray diffraction data of thin films showed that the increase of oxygen flow promotes a preferred orientation of (001) LiNbO 3 planes parallel to the substrate surface. Surface roughness and grain size, observed by atomic force microscopy, change also with oxygen flow. © 2002 Taylor & Francis.
dc.languageeng
dc.relationFerroelectrics
dc.relation0.728
dc.relation0,260
dc.rightsAcesso aberto
dc.sourceScopus
dc.subjectCrystallization
dc.subjectLiNbO 3
dc.subjectRietveld analysis
dc.subjectLiNbO3
dc.subjectOxygen flow
dc.subjectSubstrate surface
dc.subjectAtomic force microscopy
dc.subjectCrystalline materials
dc.subjectFlow of fluids
dc.subjectLithium niobate
dc.subjectMorphology
dc.subjectOxygen
dc.subjectSilicon
dc.subjectSpin coating
dc.subjectThin films
dc.titleInfluence of oxygen flow on crystallization and morphology of LiNbO 3 thin films
dc.typeTrabalho apresentado em evento


Este ítem pertenece a la siguiente institución