dc.contributor | Universidade Estadual Paulista (Unesp) | |
dc.date.accessioned | 2014-05-27T11:20:18Z | |
dc.date.accessioned | 2022-10-05T17:44:16Z | |
dc.date.available | 2014-05-27T11:20:18Z | |
dc.date.available | 2022-10-05T17:44:16Z | |
dc.date.created | 2014-05-27T11:20:18Z | |
dc.date.issued | 2001-10-01 | |
dc.identifier | Journal of Materials Research, v. 16, n. 10, p. 3009-3013, 2001. | |
dc.identifier | 0884-2914 | |
dc.identifier | http://hdl.handle.net/11449/66590 | |
dc.identifier | 10.1557/JMR.2001.0413 | |
dc.identifier | WOS:000171429600039 | |
dc.identifier | 2-s2.0-0035494725 | |
dc.identifier | 2-s2.0-0035494725.pdf | |
dc.identifier.uri | http://repositorioslatinoamericanos.uchile.cl/handle/2250/3916335 | |
dc.description.abstract | Strontium barium niobate (SBN) thin films were crystallized by conventional electric furnace annealing and by rapid-thermal annealing (RTA) at different temperatures. The average grain size of films was 70 nm and thickness around 500 nm. Using x-ray diffraction, we identified the presence of polycrystalline SBN phase for films annealed from 500 to 700 °C in both cases. Phases such as SrNb2O6 and BaNb2O6 were predominantly crystallized in films annealed at 500 °C, disappearing at higher temperatures. Dielectric and ferroelectric parameters obtained from films crystallized by conventional furnace and RTA presented essentially the same values. | |
dc.language | eng | |
dc.relation | Journal of Materials Research | |
dc.relation | 1.495 | |
dc.relation | 0,610 | |
dc.rights | Acesso restrito | |
dc.source | Scopus | |
dc.subject | Crystallization | |
dc.subject | Electric furnaces | |
dc.subject | Metallorganic chemical vapor deposition | |
dc.subject | Permittivity | |
dc.subject | Rapid thermal annealing | |
dc.subject | Scanning electron microscopy | |
dc.subject | Strontium compounds | |
dc.subject | X ray diffraction analysis | |
dc.subject | Metallic ions | |
dc.subject | Thin films | |
dc.title | Structural and electrical properties of strontium barium niobate thin films crystallized by conventional furnace and rapid-thermal annealing process | |
dc.type | Artigo | |