dc.contributorUniversidade Estadual de Campinas (UNICAMP)
dc.contributorUniv Southampton
dc.contributorUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:29:57Z
dc.date.accessioned2022-10-05T16:56:26Z
dc.date.available2014-05-20T15:29:57Z
dc.date.available2022-10-05T16:56:26Z
dc.date.created2014-05-20T15:29:57Z
dc.date.issued2007-07-15
dc.identifierApplied Surface Science. Amsterdam: Elsevier B.V., v. 253, n. 18, p. 7381-7386, 2007.
dc.identifier0169-4332
dc.identifierhttp://hdl.handle.net/11449/39417
dc.identifier10.1016/j.apsusc.2007.03.023
dc.identifierWOS:000247863800006
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/3910531
dc.description.abstractField emission properties of hot filament chemical vapor deposited boron doped polycrystalline diamond have been studied. Doping level (N-B) of different samples has been varied by the B/C concentration in the gas feed during the growth process and doping saturation has been observed for high B/C ratios. Threshold field (E-th) for electron emission as function of B/C concentration has been measured, and the influences of grain boundaries, doping level and surface morphology on field emission properties have been investigated. Carrier transport through conductive grains and local emission properties of surface sites have been figured out to be two independent limiting effects in respect of field emission. Emitter current densities of 500 nA cm(-2) were obtained using electric fields less than 8 V/mu m. (c) 2007 Elsevier B.V. All rights reserved.
dc.languageeng
dc.publisherElsevier B.V.
dc.relationApplied Surface Science
dc.relation4.439
dc.relation1,093
dc.rightsAcesso restrito
dc.sourceWeb of Science
dc.subjectboron doped diamond surface
dc.subjectelectron field emission
dc.subjectchemical vapor deposited diamond
dc.subjectthreshold field for electron emission
dc.subjectemission properties of surface sites
dc.titleElectron field emission from boron doped microcrystalline diamond
dc.typeArtigo


Este ítem pertenece a la siguiente institución