dc.contributorUniversidade Estadual Paulista (Unesp)
dc.contributorENSCI
dc.contributorUniversidade de São Paulo (USP)
dc.contributorUPS
dc.date.accessioned2014-05-20T15:24:37Z
dc.date.accessioned2022-10-05T16:29:22Z
dc.date.available2014-05-20T15:24:37Z
dc.date.available2022-10-05T16:29:22Z
dc.date.created2014-05-20T15:24:37Z
dc.date.issued2002-09-02
dc.identifierThin Solid Films. Lausanne: Elsevier B.V. Sa, v. 416, n. 1-2, p. 284-293, 2002.
dc.identifier0040-6090
dc.identifierhttp://hdl.handle.net/11449/35200
dc.identifier10.1016/S0040-6090(02)00531-X
dc.identifierWOS:000178582700043
dc.identifier5584298681870865
dc.identifier9971202585286967
dc.identifier0000-0002-8356-8093
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/3907187
dc.description.abstractThe influence of the substrate temperature on the structural features and opto-electrical properties of undoped and indium-doped ZnO thin films deposited by pyrosol process was investigated. The addition of indium induces a drastic decrease (by a factor approximate to 10(10) for samples deposited at 300 degreesC) in the electrical resistivity of films, the lowest electrical resistivity (6 mOmega-cm) being observed for the film deposited at 450 degreesC. Films are highly transparent (>80%) in the Vis-NIR ranges, and the optical band gap exhibits a blue shift (from 3.29 to 3.33 eV) for the In-doped films deposited at increasing temperature. Preferential orientation of the ZnO crystallites with the c-axis perpendicular to the substrate surface and an anisotropic morphology of the nanoporous structure was observed for films growth at 300 and 350 degreesC. (C) 2002 Elsevier B.V. B.V. All rights reserved.
dc.languageeng
dc.publisherElsevier B.V.
dc.relationThin Solid Films
dc.relation1.939
dc.relation0,617
dc.rightsAcesso restrito
dc.sourceWeb of Science
dc.subjectelectrical properties
dc.subjectnanostructures
dc.subjectoptical coatings
dc.subjectzinc oxide
dc.titleStructural electrical and optical properties of undoped and indium doped ZnO thin films prepared by the pyrosol process at different temperatures
dc.typeArtigo


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