dc.contributorUniversidade Estadual Paulista (Unesp)
dc.contributorUniversidade Federal do Paraná (UFPR)
dc.date.accessioned2014-05-20T13:27:35Z
dc.date.accessioned2022-10-05T13:23:13Z
dc.date.available2014-05-20T13:27:35Z
dc.date.available2022-10-05T13:23:13Z
dc.date.created2014-05-20T13:27:35Z
dc.date.issued2002-05-01
dc.identifierNuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 191, p. 704-707, 2002.
dc.identifier0168-583X
dc.identifierhttp://hdl.handle.net/11449/9115
dc.identifier10.1016/S0168-583X(02)00637-7
dc.identifierWOS:000176692300134
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/3885544
dc.description.abstractPolymer films, deposited from acetylene and argon plasma mixtures, were bombarded with 150 keV He+ ions, varying the fluence, Phi, from 10(18) to 10(21) ions/m(2). Molecular structure and optical gap of the samples were investigated by infrared and ultraviolet-visible spectroscopies, respectively. Two-point probe was employed to determine the electrical resistivity while hardness was measured by nanoindentation technique. It was verified modification of the molecular structure and composition of the films. There was loss of H and increment in the concentration of unsaturated carbon bonds with Phi. Optical gap and electrical resistivity decreased while hardness increased with Phi. Interpretation of these results is proposed in terms of chain crosslinking and unsaturation. (C) 2002 Elsevier B.V. B.V. All rights reserved.
dc.languageeng
dc.publisherElsevier B.V.
dc.relationNuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms
dc.relation1.323
dc.rightsAcesso restrito
dc.sourceWeb of Science
dc.subjectplasma polymers
dc.subjection implantation
dc.subjectoptical and electrical properties
dc.subjecthardness
dc.titleEffect of helium implantation on the properties of plasma polymer films
dc.typeArtigo


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