Performance characterization of an xy-stage applied to micrometric laser direct writing lithography

dc.creatorJaramillo J.
dc.creatorZarzycki A.
dc.creatorGaleano J.
dc.creatorSandoz P.
dc.date.accessioned2020-08-28T22:28:08Z
dc.date.accessioned2022-09-29T12:44:47Z
dc.date.available2020-08-28T22:28:08Z
dc.date.available2022-09-29T12:44:47Z
dc.date.created2020-08-28T22:28:08Z
dc.date.issued2017
dc.identifierhttp://hdl.handle.net/20.500.12622/3479
dc.identifier10.3390/s17020278
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/3753075
dc.relation2
dc.relation17
dc.sourceScopus
dc.sourcehttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85011662546&doi=10.3390%2fs17020278&partnerID=40&md5=5096edbe32fc296b8b8268928bae6caf
dc.titlePerformance characterization of an xy-stage applied to micrometric laser direct writing lithography
dc.typeinfo:eu-repo/semantics/article


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