dc.creatorCastro, C. P. de
dc.creatorAssis, Thiago Albuquerque de
dc.creatorCastilho, Caio M??rio Castro de
dc.creatorAndrade, Roberto Fernandes Silva
dc.date.accessioned2019-05-22T15:56:01Z
dc.date.available2019-05-22T15:56:01Z
dc.date.issued2014
dc.identifier0953-8984
dc.identifierhttp://repositorio.ufba.br/ri/handle/ri/17368
dc.identifierv. 26, n. 44
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/2711899
dc.description.abstract
dc.languageen
dc.rightsrestrito
dc.sourcehttp://dx.doi.org/10.1088/0953-8984/26/44/445007
dc.subjectFilms
dc.subjectInterfaces and solids
dc.subjectElectric potential
dc.subjectCold field emission
dc.titleHeight distribution of equipotential lines in a region confined by a rough conducting boundary
dc.typeArtigo de Peri??dico


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