| dc.creator | Assis, Thiago Albuquerque de | |
| dc.creator | Reis, F. D. A. Aar??o | |
| dc.date.accessioned | 2019-05-22T15:44:05Z | |
| dc.date.available | 2019-05-22T15:44:05Z | |
| dc.date.issued | 2013 | |
| dc.identifier | 1742-5468 | |
| dc.identifier | http://repositorio.ufba.br/ri/handle/ri/15019 | |
| dc.identifier.uri | http://repositorioslatinoamericanos.uchile.cl/handle/2250/2709710 | |
| dc.description.abstract | | |
| dc.language | en | |
| dc.rights | restrito | |
| dc.source | http://dx.doi.org/10.1088/1742-5468/2013/10/P10008 | |
| dc.subject | Chemical vapor deposition (theory) | |
| dc.subject | Kinetic roughening (theory) | |
| dc.subject | Surface di usion (theory) | |
| dc.subject | Thin lm deposition (theory) | |
| dc.title | Thin film deposition with time-varying temperature | |
| dc.type | Artigo de Peri??dico | |
