dc.contributorINPE LAS
dc.contributorUniversidade Estadual Paulista (Unesp)
dc.contributorInst Fed Educ Ciencia & Tecnol Sao Paulo
dc.contributorUniversidade Federal de São Carlos (UFSCar)
dc.date.accessioned2015-03-18T15:53:17Z
dc.date.available2015-03-18T15:53:17Z
dc.date.created2015-03-18T15:53:17Z
dc.date.issued2014-08-30
dc.identifierApplied Surface Science. Amsterdam: Elsevier Science Bv, v. 311, p. 5-8, 2014.
dc.identifier0169-4332
dc.identifierhttp://hdl.handle.net/11449/116418
dc.identifier10.1016/j.apsusc.2014.04.161
dc.identifierWOS:000339037200002
dc.identifier1312983845888585
dc.description.abstractThe influence of doping level in the electronic conductivity and resistivity properties of synthetic diamond films grown by hot filament chemical vapor deposition (HFCVD) was investigated. Eight different doping level concentrations varied from 500 to 30,000 ppm were considered. The polycrystalline morphology observed by scanning electron microscopy and Raman spectra was strongly affected by the addition of boron. The electric characterization by Hall effect as a function of temperature and magnetic field showed that at sufficiently low temperatures, electrical conduction is dominated by variable range hopping (VRH) conducting process. The resistivity was also investigated by temperature-dependent transport measurements in order to investigate the conduction mechanism in the doped samples. The samples exhibited the VRH (m = 1/4) mechanism in the temperature range from 77 to 300 K. The interface between metal, and our HFCVD diamond was also investigated for the lower doped samples. (C) 2014 Elsevier B.V. All rights reserved.
dc.languageeng
dc.publisherElsevier B.V.
dc.relationApplied Surface Science
dc.relation4.439
dc.relation1,093
dc.rightsAcesso restrito
dc.sourceWeb of Science
dc.subjectDiamond
dc.subjectBDD
dc.subjectHall effect
dc.titleTransport properties of polycrystalline boron doped diamond
dc.typeArtículos de revistas


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