dc.contributor | Universidade de São Paulo (USP) | |
dc.contributor | Universidade Estadual de Campinas (UNICAMP) | |
dc.contributor | Universidade Federal de São Carlos (UFSCar) | |
dc.contributor | Universidade Estadual Paulista (Unesp) | |
dc.date.accessioned | 2014-05-27T11:21:20Z | |
dc.date.available | 2014-05-27T11:21:20Z | |
dc.date.created | 2014-05-27T11:21:20Z | |
dc.date.issued | 2005-06-01 | |
dc.identifier | Journal of Colloid and Interface Science, v. 286, n. 1, p. 303-309, 2005. | |
dc.identifier | 0021-9797 | |
dc.identifier | http://hdl.handle.net/11449/68247 | |
dc.identifier | 10.1016/j.jcis.2005.01.019 | |
dc.identifier | 2-s2.0-17744371164 | |
dc.identifier | 6796683603864969 | |
dc.description.abstract | The present paper describes the one-pot procedure for the formation of self-assembled thin films of two silanes on the model oxidized silicon wafer, SiO2/Si. SiO2/Si is a model system for other surfaces, such as glass, quartz, aerosol, and silica gel. MALDI-TOF MS with and without a matrix, XPS, and AFM have confirmed the formation of self-assembled thin films of both 3-imidazolylpropyltrimethoxysilane (3-IPTS) and 4-(N- propyltriethoxysilane-imino)pyridine (4-PTSIP) on the SiO2/Si surface after 30 min. Longer adsorption times lead to the deposition of nonreacted 3-IPTS precursors and the formation of agglomerates on the 3-IPTS monolayer. The formation of 4-PTSIP self-assembled layers on SiO2/Si is also demonstrated. The present results for the flat SiO2/Si surface can lead to a better understanding of the formation of a stationary phase for affinity chromatography as well as transition-metal-supported catalysts on silica and their relationship with surface roughness and ordering. The 3-IPTS and 4-PTSIP modified SiO2/Si wafers can also be envisaged as possible built-on-silicon thin-layer chromatography (TLC) extraction devices for metal determination or N-heterocycle analytes, such as histidine and histamine, with on-spot MALDI-TOF MS detection. © 2005 Elsevier Inc. All rights reserved. | |
dc.language | eng | |
dc.relation | Journal of Colloid and Interface Science | |
dc.relation | 5.091 | |
dc.relation | 1,221 | |
dc.rights | Acesso restrito | |
dc.source | Scopus | |
dc.subject | 3-Imidazolylpropyltrimethoxysilane | |
dc.subject | 4-(N-Propyltriethoxysilane-imino) pyridine | |
dc.subject | AFM | |
dc.subject | MALDI-TOF MS | |
dc.subject | Self-assembled thin films | |
dc.subject | Silicon dioxide | |
dc.subject | Silicon wafer | |
dc.subject | XPS | |
dc.subject | Aerosols | |
dc.subject | Agglomeration | |
dc.subject | Glass | |
dc.subject | Mathematical models | |
dc.subject | Monolayers | |
dc.subject | Oxidation | |
dc.subject | Quartz | |
dc.subject | Self assembly | |
dc.subject | Silanes | |
dc.subject | Silica | |
dc.subject | Surface chemistry | |
dc.subject | Thin films | |
dc.subject | Thin layer chromatography | |
dc.subject | Model systems | |
dc.subject | Nitrogenated Lewis bases | |
dc.subject | Oxidized silicon wafers | |
dc.subject | Adsorption | |
dc.subject | heterocyclic compound | |
dc.subject | histamine | |
dc.subject | histidine | |
dc.subject | Lewis base | |
dc.subject | silane derivative | |
dc.subject | silicon dioxide | |
dc.subject | transition element | |
dc.subject | adsorption | |
dc.subject | affinity chromatography | |
dc.subject | atomic force microscopy | |
dc.subject | chemical model | |
dc.subject | chemical reaction | |
dc.subject | film | |
dc.subject | matrix assisted laser desorption ionization time of flight mass spectrometry | |
dc.subject | metal extraction | |
dc.subject | nitration | |
dc.subject | oxidation kinetics | |
dc.subject | phase transition | |
dc.subject | priority journal | |
dc.subject | reaction analysis | |
dc.subject | thin layer chromatography | |
dc.subject | X ray powder diffraction | |
dc.title | Adsorption of silanes bearing nitrogenated Lewis bases on SiO 2/Si (100) model surfaces | |
dc.type | Artículos de revistas | |