dc.contributorUniversidade Federal de São Carlos (UFSCar)
dc.contributorUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-27T11:20:29Z
dc.date.available2014-05-27T11:20:29Z
dc.date.created2014-05-27T11:20:29Z
dc.date.issued2002-08-01
dc.identifierJournal of Luminescence, v. 99, n. 1, p. 7-12, 2002.
dc.identifier0022-2313
dc.identifierhttp://hdl.handle.net/11449/66943
dc.identifier10.1016/S0022-2313(02)00325-3
dc.identifierWOS:000177203800002
dc.identifier2-s2.0-0036679777
dc.description.abstractPb1-xLaxTiO3 thin films, (X=0.0; 13 and 0.27mol%) were prepared by the polymeric precursor method. Thin films were deposited on Pt/Ti/SiO2/Si(111), Si(100) and glass substrates by spin coating, and annealed in the 200-300°C range in an O2 atmosphere. X-ray diffraction, scanning electron microscopy and atomic force microscopy were used for the microstructural characterization of the thin films. Photoluminescence (PL) at room temperature has been observed in thin films of (PbLa)TiO3. The films deposited on Pt/Ti/SiO2/Si substrates present PL intensity greater than those deposited on glass and silicon substrates. The intensity of PL in these thin films was found to be dependent on the thermal treatment and lanthanum molar concentration. © 2002 Elsevier Science B.V. All rights reserved.
dc.languageeng
dc.relationJournal of Luminescence
dc.relation2.732
dc.relation0,694
dc.rightsAcesso restrito
dc.sourceScopus
dc.subjectPhotoluminescence
dc.subjectRare earth dopant
dc.subjectThin film
dc.subjectAmorphous films
dc.subjectAnnealing
dc.subjectAtomic force microscopy
dc.subjectCharacterization
dc.subjectDeposition
dc.subjectGlass
dc.subjectLead compounds
dc.subjectMicrostructure
dc.subjectScanning electron microscopy
dc.subjectSpin coating
dc.subjectSubstrates
dc.subjectThermal effects
dc.subjectThin films
dc.subjectX ray diffraction analysis
dc.subjectPolymeric precursors
dc.titlePhotoluminescence in amorphous (PbLa)TiO3 thin films deposited on different substrates
dc.typeArtículos de revistas


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