dc.contributorUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:32:20Z
dc.date.available2014-05-20T15:32:20Z
dc.date.created2014-05-20T15:32:20Z
dc.date.issued2009-05-01
dc.identifierMaterials Characterization. New York: Elsevier B.V., v. 60, n. 5, p. 353-356, 2009.
dc.identifier1044-5803
dc.identifierhttp://hdl.handle.net/11449/41273
dc.identifier10.1016/j.matchar.2008.09.015
dc.identifierWOS:000265153800001
dc.identifier3573363486614904
dc.description.abstractFatigue-free Bi3.25La0.75Ti3O12 (BLT) thin films were grown on LaNiO3 bottom electrodes grown in a microwave furnace at 700 degrees C for 10 min from the polymeric precursor method. It was found that LaNiO3 (LNO) bottom electrode with pseudocubic structure strongly promote the formation. of (001) texture of BLT films. The remanent polarization (P-r) and the drive voltage (V-c) were 11 mu C/cm(2) and 1.3 V respectively, and are better than the values found in the literature. The polarization of the Au/BLT/LNO/SiO2/Si (100) capacitors with a thickness of 280 nm exhibited no degradation after 1 x 1010 switching cycles at an applied voltage of 5 V with a frequency of 1 MHz. After several tests the capacitors retain 77% of its polarization upon a retention time of 10(4) s. (C) 2008 Elsevier B.V. All rights reserved.
dc.languageeng
dc.publisherElsevier B.V.
dc.relationMaterials Characterization
dc.relation2.892
dc.relation1,291
dc.rightsAcesso restrito
dc.sourceWeb of Science
dc.subjectThin films
dc.subjectMicrowave furnace
dc.subjectBottom electrode
dc.subjectCapacitor
dc.subjectRetention
dc.titleFatigue and retention properties of Bi3.25La0.75Ti3O12 films using LaNiO3 bottom electrodes
dc.typeArtículos de revistas


Este ítem pertenece a la siguiente institución