Infrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ions

dc.contributorUniversidade Estadual de Campinas (UNICAMP)
dc.contributorUniversidade Estadual Paulista (Unesp)
dc.date.accessioned2014-05-20T15:25:54Z
dc.date.available2014-05-20T15:25:54Z
dc.date.created2014-05-20T15:25:54Z
dc.date.issued2006-08-01
dc.identifierNuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms. Amsterdam: Elsevier B.V., v. 249, p. 162-166, 2006.
dc.identifier0168-583X
dc.identifierhttp://hdl.handle.net/11449/36217
dc.identifier10.1016/j.nimb.2006.03.105
dc.identifierWOS:000239545000042
dc.identifier0000-0002-4511-3768
dc.description.abstractThis work illustrates the advantages of using p-polarized radiation at an incidence angle of 70 degrees in contrast to the conventional unpolarized beam at normal (or near-normal) incidence for the infrared spectroscopic study of polycarbosilane, polysilazane and polysiloxane thin films synthesized by plasma enhanced chemical vapor deposition (PECVD) and subsequently irradiated with 170 keV He+ ions at fluences from 1 x 10(14) to 1 x 10(16) cm(-2). Several bands not seen using the conventional mode could be observed in the polarized mode. (c) 2006 Elsevier B.V. All rights reserved.
dc.languageeng
dc.publisherElsevier B.V.
dc.relationNuclear Instruments & Methods In Physics Research Section B-beam Interactions With Materials and Atoms
dc.relation1.323
dc.rightsAcesso restrito
dc.sourceWeb of Science
dc.subjection irradiation
dc.subjectSi-based polymer film
dc.subjectplasma polymerization
dc.subjectchemical structure
dc.subjectFTIR
dc.titleInfrared spectroscopy investigation of various plasma-deposited polymer films irradiated with 170 keV He+ ions
dc.typeArtículos de revistas


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