dc.contributorUniversidade Estadual Paulista (Unesp)
dc.contributorUniversity of Belgrade
dc.date.accessioned2014-05-20T14:17:56Z
dc.date.available2014-05-20T14:17:56Z
dc.date.created2014-05-20T14:17:56Z
dc.date.issued2004-08-01
dc.identifierMaterials Letters. Amsterdam: Elsevier B.V., v. 58, n. 20, p. 2537-2540, 2004.
dc.identifier0167-577X
dc.identifierhttp://hdl.handle.net/11449/25378
dc.identifier10.1016/j.matlet.2004.03.025
dc.identifierWOS:000222200000020
dc.identifier9128353103083394
dc.description.abstractThin films of potassium niobate were deposited on (100) Si substrates by the polymeric precursor method (Pechini method). Annealing in static air was performed at 600degrees C for 20 h. The obtained films were characterized by X-ray diffraction and atomic force microscopy (AFM). Electrical characterization of the films pointed to ferroelectricity via hysteresis loop. The dielectric constant, dissipation factor and resistance were measured in frequency region from 10 Hz to 10 MHz. At 1 MHz, the dielectric constant was 158 and the dissipation factor was 0.11. (C) 2004 Elsevier B.V. All rights reserved.
dc.languageeng
dc.publisherElsevier B.V.
dc.relationMaterials Letters
dc.relation2.687
dc.rightsAcesso restrito
dc.sourceWeb of Science
dc.subjectKNbO3
dc.subjectdielectric constant
dc.subjectdissipation factor
dc.titlePotassium niobate thin films prepared through polymeric precursor method
dc.typeArtículos de revistas


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