dc.creatorGarcia Einschlag, Fernando Sebastian
dc.creatorCarlos, Luciano
dc.creatorCapparelli, Alberto Luis
dc.date.accessioned2017-11-21T13:30:43Z
dc.date.accessioned2018-11-06T15:53:12Z
dc.date.available2017-11-21T13:30:43Z
dc.date.available2018-11-06T15:53:12Z
dc.date.created2017-11-21T13:30:43Z
dc.date.issued2003-12
dc.identifierGarcia Einschlag, Fernando Sebastian; Carlos, Luciano; Capparelli, Alberto Luis; Competition kinetics using the UV/H2O2 process: a structure reactivity correlation for the rate constants of hydroxyl radicals toward nitroaromatic compounds; Pergamon-Elsevier Science Ltd.; Chemosphere; 53; 12-2003; 1-7
dc.identifier0045-6535
dc.identifierhttp://hdl.handle.net/11336/28584
dc.identifierCONICET Digital
dc.identifierCONICET
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1902156
dc.description.abstractThe rate constants for hydroxyl radical reaction toward a set of nitroaromatic substrates kS, have been measured at 25ºC using competition experiments in the UV/H2O2 process. For a given pair of substrates S1 and S2, the relative reactivity beta(defined as kS1/kS2) was calculated from the slope of the corresponding double logarithmic plot, i.e., of ln[S1] vs. Ln[S2]. This method is more accurate and remained linear for larger conversions in comparison with the plots of ln[S1] and ln[S2] against time. The rate constants measured ranged from 0.33 to 8.6 10<sup>9</sup> M-1 s-1. A quantitative structure–reactivity relationship was found using the Hammett equation. Assuming sigma values to be additive, a value of -0.60 was obtained for the reaction constant rho. This value agrees with the high reactivity and the electrophilic nature of HO•.radical.
dc.languageeng
dc.publisherPergamon-Elsevier Science Ltd.
dc.relationinfo:eu-repo/semantics/altIdentifier/doi/http://dx.doi.org/10.1016/S0045-6535(03)00388-6
dc.rightshttps://creativecommons.org/licenses/by-nc-sa/2.5/ar/
dc.rightsinfo:eu-repo/semantics/restrictedAccess
dc.subjectADVANCED OXIDATION PROCESSES
dc.subjectNITROAROMATIC COMPOUNDS
dc.subjectHYDROXYL RADICALS
dc.subjectCOMPETITIVE KINETICS
dc.titleCompetition kinetics using the UV/H2O2 process: a structure reactivity correlation for the rate constants of hydroxyl radicals toward nitroaromatic compounds
dc.typeArtículos de revistas
dc.typeArtículos de revistas
dc.typeArtículos de revistas


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