dc.creatorNúñez García, Javier Luis Mariano
dc.creatorD'Elía, R.
dc.creatorHeredia, Eduardo Armando
dc.creatorGeraci, A.
dc.creatorTolley, Alfredo Juan
dc.creatorDi Stefano, M.C.
dc.creatorCabanillas, Edgardo Domingo
dc.creatorMartínez, A. M.
dc.creatorTrigubo, Alicia Beatriz
dc.date.accessioned2018-07-12T17:53:04Z
dc.date.accessioned2018-11-06T12:25:53Z
dc.date.available2018-07-12T17:53:04Z
dc.date.available2018-11-06T12:25:53Z
dc.date.created2018-07-12T17:53:04Z
dc.date.issued2015-07
dc.identifierNúñez García, Javier Luis Mariano; D'Elía, R.; Heredia, Eduardo Armando; Geraci, A.; Tolley, Alfredo Juan; et al.; Crystalline Quality of CdSe Single Crystalline Commercial Wafer; Elsevier; Procedia Materials Science; 9; 7-2015; 444-449
dc.identifier2211-8128
dc.identifierhttp://hdl.handle.net/11336/51876
dc.identifierCONICET Digital
dc.identifierCONICET
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1866505
dc.description.abstractCadmium selenide is II-VI semiconductor compound with 1.67 eV energy gap (≈ 300 K) and high stopping power for nuclear radiation. Its crystalline structure is hexagonal (wurtzite) and it is used in solar cells, transistors, light emitting diodes, electroluminescent devices, nuclear radiation detectors at room temperature and nonlinear optical devices. It is also employed as substrate for epitaxial growth of HgCdSe. Qualities of devices are critically dependent on their material properties. Crystalline characterization of a CdSe commercial wafer was our main goal. The crystalline quality was evaluated by different techniques. Since it is used as an optical window in the IR spectrum, its optical transmittance was measured by FTIR. The etch pits distribution was determined by chemical etching. Dislocation density was obtained by counting on optical micrographs meanwhile misorientation between adjacent subgrains by means of Shockley - Read approximation. The reliability of the techniques used in determining the crystalline quality was evaluated. The etching solution was sensitive in linear defects detection and crystalline quality was adequate for devices manufacture of this material. Transmission electron microscopy employment confirmed these result.
dc.languageeng
dc.publisherElsevier
dc.relationinfo:eu-repo/semantics/altIdentifier/doi/https://dx.doi.org/10.1016/j.mspro.2015.05.015
dc.relationinfo:eu-repo/semantics/altIdentifier/url/https://www.sciencedirect.com/science/article/pii/S2211812815001996
dc.rightshttps://creativecommons.org/licenses/by-nc-nd/2.5/ar/
dc.rightsinfo:eu-repo/semantics/openAccess
dc.subjectCdSe
dc.subjectSemiconductor
dc.subjectDetectors
dc.subjectNuclear
dc.subjectFourier Transform Infrared Spectroscopy
dc.subjectChemical Etching
dc.subjectTEM
dc.titleCrystalline Quality of CdSe Single Crystalline Commercial Wafer
dc.typeArtículos de revistas
dc.typeArtículos de revistas
dc.typeArtículos de revistas


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