Quantum atomic lithography via cross-cavity optical Stern-Gerlach setup

dc.creatorMáximo, C. E.
dc.creatorBatalhão, T. B.
dc.creatorBachelard, R.
dc.creatorMoraes Neto, G. D.
dc.creatorPonte, M. A.
dc.creatorMoussa, Miled Hassan Youssef
dc.date.accessioned2016-07-20T20:08:02Z
dc.date.accessioned2018-07-04T17:08:52Z
dc.date.available2016-07-20T20:08:02Z
dc.date.available2018-07-04T17:08:52Z
dc.date.created2016-07-20T20:08:02Z
dc.date.issued2014-10
dc.identifierJournal of the Optical Society of America B,Washington, DC : Optical Society of America - OSA,v. 31, n. 10, p. 2480-2484, Oct. 2014
dc.identifierX0740-3224
dc.identifierhttp://www.producao.usp.br/handle/BDPI/50455
dc.identifier10.1364/JOSAB.31.002480
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1645292
dc.description.abstractWe present a fully quantum scheme to perform two-dimensional atomic lithography based on a cross-cavity optical Stern-Gerlach setup: an array of two mutually orthogonal cavities crossed by an atomic beam perpendicular to their optical axes, which is made to interact with two identical modes. After deriving an analytical solution for the atomic momentum distribution, we introduce a protocol allowing us to control the atomic deflection by manipulating the amplitudes and phases of the cavity field states. Our quantum scheme provides subwavelength resolution in the nanometer scale for the microwave regime.
dc.languageeng
dc.publisherOptical Society of America - OSA
dc.publisherWashington, DC
dc.relationJournal of the Optical Society of America B
dc.rightsCopyright Optical Society of America
dc.rightsrestrictedAccess
dc.titleQuantum atomic lithography via cross-cavity optical Stern-Gerlach setup
dc.typeArtículos de revistas


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