dc.creatorSalvadori, Maria Cecilia Barbosa da Silveira
dc.creatorTeixeira, Fernanda de Sá
dc.creatorSgubin, Leonardo Gimenes
dc.creatorAraujo, Wagner Wlysses Rodrigues de
dc.creatorSpirin, R. E.
dc.creatorCattani, Mauro Sergio Dorsa
dc.creatorOks, E. M.
dc.creatorBrown, Ian Gordon
dc.date.accessioned2014-03-12T17:53:32Z
dc.date.accessioned2018-07-04T16:44:12Z
dc.date.available2014-03-12T17:53:32Z
dc.date.available2018-07-04T16:44:12Z
dc.date.created2014-03-12T17:53:32Z
dc.date.issued2014-02-21
dc.identifierInternational Conference on Ion Sources (ICIS 13), 2013, Chiba. Program and Abstracts of the ICIS 13, 2013.
dc.identifierhttp://www.producao.usp.br/handle/BDPI/44108
dc.identifierhttp://dx.doi.org/10.1063/1.4824755
dc.identifierhttp://scitation.aip.org/content/aip/journal/rsi/85/2/10.1063/1.4824755
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1639657
dc.description.abstractWe describe an approach to ion implantation in which the plasma and its electronics are held at ground potential and the ion beam is injected into a space held at high negative potential, allowing considerable savings both economically and technologically. We used an “inverted ion implanter” of this kind to carry out implantation of gold into alumina, with Au ion energy 40 keV and dose (3–9) × 1016 cm−2. Resistivity was measured in situ as a function of dose and compared with predictions of a model based on percolation theory, in which electron transport in the composite is explained by conduction through a random resistor network formed by Au nanoparticles. Excellent agreement is found between the experimental results and the theory.
dc.languageeng
dc.publisherAIP Publishing
dc.publisherAIP Publishing LLC
dc.publisherNova York
dc.relationReview of Scientific Instruments
dc.rightsAIP Publishing LLC
dc.rightsopenAccess
dc.subjectGold ion
dc.subjectIon implantation
dc.subjectComposite materials
dc.titleGold ion implantation into alumina using an “inverted ion source” configuration.
dc.typeArtículos de revistas


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