Artículos de revistas
Numerical simulation of the liquid phase in SnO(2) thin film deposition by sol-gel-dip-coating
Fecha
2010Registro en:
JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, v.55, n.3, p.385-393, 2010
0928-0707
10.1007/s10971-010-2263-0
Autor
CARVALHO, Dayene M.
MACIEL JR., Jorge L. B.
RAVARO, Leandro P.
GARCIA, Rogerio E.
FERREIRA, Valdemir G.
SCALVI, Luis V. A.
Institución
Resumen
The fluid flow of the liquid phase in the sol-gel-dip-coating process for SnO(2) thin film deposition is numerically simulated. This calculation yields useful information on the velocity distribution close to the substrate, where the film is deposited. The fluid modeling is done by assuming Newtonian behavior, since the linear relation between shear stress and velocity gradient is observed. Besides, very low viscosities are used. The fluid governing equations are the Navier-Stokes in the two dimensional form, discretized by the finite difference technique. Results of optical transmittance and X-ray diffraction on films obtained from colloidal suspensions with regular viscosity, confirm the substrate base as the thickest part of the film, as inferred from the numerical simulation. In addition, as the viscosity increases, the fluid acquires more uniform velocity distribution close to the substrate, leading to more homogenous and uniform films.