Layout and material gradation in topology optimization of functionally graded structures: a global-local approach

dc.creatorALMEIDA, Sylvia R. M.
dc.creatorPAULINO, Glaucio H.
dc.creatorSILVA, Emilio C. N.
dc.date.accessioned2012-10-19T01:43:22Z
dc.date.accessioned2018-07-04T14:50:11Z
dc.date.available2012-10-19T01:43:22Z
dc.date.available2018-07-04T14:50:11Z
dc.date.created2012-10-19T01:43:22Z
dc.date.issued2010
dc.identifierSTRUCTURAL AND MULTIDISCIPLINARY OPTIMIZATION, v.42, n.6, p.855-868, 2010
dc.identifier1615-147X
dc.identifierhttp://producao.usp.br/handle/BDPI/18318
dc.identifier10.1007/s00158-010-0514-x
dc.identifierhttp://dx.doi.org/10.1007/s00158-010-0514-x
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1615113
dc.description.abstractBy means of continuous topology optimization, this paper discusses the influence of material gradation and layout in the overall stiffness behavior of functionally graded structures. The formulation is associated to symmetry and pattern repetition constraints, including material gradation effects at both global and local levels. For instance, constraints associated with pattern repetition are applied by considering material gradation either on the global structure or locally over the specific pattern. By means of pattern repetition, we recover previous results in the literature which were obtained using homogenization and optimization of cellular materials.
dc.languageeng
dc.publisherSPRINGER
dc.relationStructural and Multidisciplinary Optimization
dc.rightsCopyright SPRINGER
dc.rightsrestrictedAccess
dc.subjectTopology optimization
dc.subjectFunctionally graded materials
dc.subjectFunctionally graded structures
dc.subjectMaterial layout
dc.subjectMaterial gradation
dc.subjectSymmetry and pattern repetition constraints
dc.titleLayout and material gradation in topology optimization of functionally graded structures: a global-local approach
dc.typeArtículos de revistas


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