Annealing Effects On The Structural And Optical Properties Of Vanadium Oxide Film Obtained By The Hot-filament Metal Oxide Deposition Technique (hfmod)

dc.creatorScarminio
dc.creatorJair; Silva
dc.creatorPaulo Rogério Catarini da; Gelamo
dc.creatorRogério Valentim; Moraes
dc.creatorMário Antonio Bica de
dc.date2017
dc.date2017-08-30T17:37:16Z
dc.date2017-08-30T17:37:16Z
dc.date.accessioned2018-03-29T05:30:02Z
dc.date.available2018-03-29T05:30:02Z
dc.identifierMatéria (rio De Janeiro). Rede Latino-americana De Materiais, v. 22, n. 1, p.
dc.identifier1517-7076
dc.identifierS1517-70762017000100431
dc.identifierhttp://www.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762017000100431&lng=en&tlng=en
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/324734
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1358952
dc.descriptionVanadium oxide films amorphous, nonstoichiometric and highly absorbing in the optical region were deposited on ITO-coated glass and on silicon substrates, by the hot-filament metal oxide deposition technique (HFMOD) and oxidized by ex-situ annealing in a furnace at 200, 300, 400 and 500 ºC, under an atmosphere of argon and rarefied oxygen. X-ray diffraction, Raman and Rutherford backscattering spectroscopy as well as optical transmission were employed to characterize the amorphous and annealed films. When annealed at 200 and 300 ºC the as-deposited opaque films become transparent but still amorphous. Under treatments at 400 and 500 ºC a crystalline nonstoichiometric V2O5 structure is formed. All the annealed films became semiconducting, with their optical absorption coefficients changing with the annealing temperature. An optical gap of 2.25 eV was measured for the films annealed at 400 and 500 ºC. The annealing in rarefied oxygen atmosphere proved to be a useful and simple ex-situ method to modulate the structural and optical properties of vanadium oxide films deposited by HFMOD technique. This technique could be applied to other amorphous and non-absorbing oxide films, replacing the conventional and sometimes expensive method of modulate desirable film properties by controlling the film deposition parameters. Even more, the HFMOD technique can be an inexpensive alternative to deposit metal oxide films.
dc.description22
dc.description1
dc.languageIngles
dc.publisherRede Latino-Americana de Materiais
dc.relationMatéria (Rio de Janeiro)
dc.rightsaberto
dc.sourceScielo
dc.subjectVanadium Oxide Film
dc.subjectHfmod Technique
dc.subjectAnnealing
dc.subjectCrystalline Structure
dc.subjectOptical Absorption
dc.titleAnnealing Effects On The Structural And Optical Properties Of Vanadium Oxide Film Obtained By The Hot-filament Metal Oxide Deposition Technique (hfmod)
dc.typeArtículos de revistas


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