dc.creatorRODRIGUES, PAM
dc.creatorCERDEIRA, F
dc.creatorBEAN, JC
dc.date1992
dc.dateDEC 15
dc.date2014-12-16T11:34:06Z
dc.date2015-11-26T17:57:35Z
dc.date2014-12-16T11:34:06Z
dc.date2015-11-26T17:57:35Z
dc.date.accessioned2018-03-29T00:41:08Z
dc.date.available2018-03-29T00:41:08Z
dc.identifierPhysical Review B. American Physical Soc, v. 46, n. 23, n. 15263, n. 15269, 1992.
dc.identifier0163-1829
dc.identifierWOS:A1992KG30600035
dc.identifier10.1103/PhysRevB.46.15263
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/59675
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/59675
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/59675
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1291522
dc.descriptionWe report low-temperature (77 K) photoreflectance measurements in two Ge/Ge0.7Si0.3 strained-layer superlattices, in the photon energy range 0.8-1.8 eV. The multiple lines observed in our spectra in this energy region can be consistently explained in terms of quantum confinement of zone-center bulk Ge states. Quantitative agreement is obtained when energy-dependent masses are used for the electrons and light-hole states within a scalar three-band model. This interpretation leads to values of the average valence-band offsets in good agreement with previous ab initio theoretical calculations.
dc.description46
dc.description23
dc.description15263
dc.description15269
dc.languageen
dc.publisherAmerican Physical Soc
dc.publisherCollege Pk
dc.publisherEUA
dc.relationPhysical Review B
dc.relationPhys. Rev. B
dc.rightsaberto
dc.sourceWeb of Science
dc.subjectSemiconductor Quantum Wells
dc.subjectValence-band Offsets
dc.subjectElectronic-structure
dc.subject001 Ge
dc.subjectHeterostructures
dc.subjectSi
dc.subjectSpectroscopy
dc.subjectStates
dc.subjectGaas
dc.subjectNonparabolicity
dc.titlePHOTOREFLECTANCE IN GE/GE0.7SI0.3 STRAINED-LAYER SUPERLATTICES
dc.typeArtículos de revistas


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