dc.creatorde Castro, MPP
dc.creatorFrateschi, NC
dc.creatorBettini, J
dc.creatorde Carvalho, MM
dc.date1998
dc.dateOCT
dc.date2014-12-02T16:27:22Z
dc.date2015-11-26T17:57:24Z
dc.date2014-12-02T16:27:22Z
dc.date2015-11-26T17:57:24Z
dc.date.accessioned2018-03-29T00:40:57Z
dc.date.available2018-03-29T00:40:57Z
dc.identifierJournal Of Crystal Growth. Elsevier Science Bv, v. 193, n. 4, n. 510, n. 515, 1998.
dc.identifier0022-0248
dc.identifierWOS:000076725000010
dc.identifier10.1016/S0022-0248(98)00506-5
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/69447
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/69447
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/69447
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1291475
dc.descriptionWe present a study on the growth of lattice-matched InGaP on patterned GaAs substrates by chemical beam epitaxy. An experimental analysis of the growth on planes [100] and [111]A as a function of growth temperature and pattern dimension is presented. A simple surface kinetics model is proposed allowing the determination of diffusion length, incorporation time and free species lifetime on both planes. Incorporation on planes [111]A reduces with increase in temperature and there is indication of a relationship between evaporation time and nucleation sites on [111]A planes (C) 1998 Elsevier Science B.V. All rights reserved.
dc.description193
dc.description4
dc.description510
dc.description515
dc.languageen
dc.publisherElsevier Science Bv
dc.publisherAmsterdam
dc.publisherHolanda
dc.relationJournal Of Crystal Growth
dc.relationJ. Cryst. Growth
dc.rightsfechado
dc.rightshttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dc.sourceWeb of Science
dc.subjectpatterned substrates
dc.subjectInGaP
dc.subjectsurface kinetics
dc.subjectmigration length
dc.subjectVapor-deposition
dc.subjectBuried Heterostructure
dc.subjectLasers
dc.subjectLayers
dc.subjectGainp
dc.subjectInp
dc.titleIn0.49Ga0.51P growth on pre-patterned GaAs substrates by chemical beam epitaxy
dc.typeArtículos de revistas


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