Influence of photo-curing distance on bond strength and nanoleakage of self-etching adhesive bonds to enamel and dentin

dc.creatorde Araujo, CTP
dc.creatorPrieto, LT
dc.creatorLima, AF
dc.creatorSouza, EJ
dc.creatorDias, CTS
dc.creatorPaulillo, LAMS
dc.date2014
dc.dateFEB
dc.date2014-08-01T18:31:46Z
dc.date2015-11-26T17:55:59Z
dc.date2014-08-01T18:31:46Z
dc.date2015-11-26T17:55:59Z
dc.date.accessioned2018-03-29T00:39:40Z
dc.date.available2018-03-29T00:39:40Z
dc.identifierActa Odontologica Scandinavica. Informa Healthcare, v. 72, n. 2, n. 113, n. 119, 2014.
dc.identifier0001-6357
dc.identifier1502-3850
dc.identifierWOS:000333047000005
dc.identifier10.3109/00016357.2013.805431
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/80242
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/80242
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1291152
dc.descriptionObjectives. To assess the influence of light-curing unit tip distance on the microtensile bond strength (mu TBS) and nanoleakage of self-etching adhesives to enamel and dentin. Materials and methods. Flat buccal surfaces were prepared on 198 bovine incisors. The teeth were randomly assigned into nine groups for mu TBS (n = 8) and nanoleakage (n = 3) testing according to the adhesive system (Clearfil Protect Bond, Clearfil Tri-S Bond or One Up Bond F Plus) and distance from the light-curing tip (0, 3 or 6 mm). The bonded samples were tested in tension (0.5 mm/min) and nanoleakage was analyzed using SEM. Results. Clearfil Protect Bond exhibited the highest tensile strength on both enamel and dentin. Leakage was higher in samples exposed at a distance of 6 mm on enamel and 0 mm on dentin. One Up Bond F Plus experienced the greatest amount of nanoleakage on both substrates. Conclusions. Light-curing unit distance did not influence the mu TBS of the adhesives, but nanoleakage increased on enamel samples when photoactivation occurred at a distance of 6 mm.
dc.description72
dc.description2
dc.description113
dc.description119
dc.languageen
dc.publisherInforma Healthcare
dc.publisherLondon
dc.publisherInglaterra
dc.relationActa Odontologica Scandinavica
dc.relationActa Odontol. Scand.
dc.rightsfechado
dc.rightshttp://informahealthcare.com/userimages/ContentEditor/1255620309227/Copyright_And_Permissions.pdf
dc.sourceWeb of Science
dc.subjectMicrotensile bond strength
dc.subjectphotoactivation
dc.subjectnanoleakage
dc.subjectSingle-step Adhesives
dc.subjectRinse Adhesives
dc.subjectMechanical-properties
dc.subjectPermeable Membranes
dc.subjectExposure Times
dc.subjectSystems
dc.subjectPerformance
dc.subjectConversion
dc.titleInfluence of photo-curing distance on bond strength and nanoleakage of self-etching adhesive bonds to enamel and dentin
dc.typeArtículos de revistas


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