dc.creatorFAJARDO, F
dc.creatorCHAMBOULEYRON, I
dc.date1995
dc.dateAUG 15
dc.date2014-12-16T11:37:06Z
dc.date2015-11-26T17:27:24Z
dc.date2014-12-16T11:37:06Z
dc.date2015-11-26T17:27:24Z
dc.date.accessioned2018-03-29T00:14:33Z
dc.date.available2018-03-29T00:14:33Z
dc.identifierPhysical Review B. Amer Physical Soc, v. 52, n. 7, n. 4965, n. 4973, 1995.
dc.identifier1098-0121
dc.identifierWOS:A1995RR50200062
dc.identifier10.1103/PhysRevB.52.4965
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/79672
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/79672
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/79672
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1284788
dc.descriptionThis work reports on the structural, optical, and transport properties of rf sputtered In-doped hydrogenated amorphous germanium thin films. It has been found that the incorporation of In induces important changes in the optoelectronic properties of the films. The experimental results may be explained in terms of acceptor levels produced by tetrahedrally coordinated In, in a way similar to In doping of c-Ge. The transition from n-type conduction of as-deposited samples to p-type conduction has been monitored through thermopower measurements. Indium concentrations of the order of 1% induce the pinning of the Fermi energy at 0.45 eV above the valence band edge and a thermally activated conductivity at room temperature having an activation energy of a few meV. The effect is explained in terms of nearest-neighbor hopping between electron states produced by In atoms in a metal-like coordination at defective sites of the Ge network.
dc.description52
dc.description7
dc.description4965
dc.description4973
dc.languageen
dc.publisherAmer Physical Soc
dc.publisherCollege Pk
dc.publisherEUA
dc.relationPhysical Review B
dc.relationPhys. Rev. B
dc.rightsaberto
dc.rightshttp://publish.aps.org/authors/transfer-of-copyright-agreement
dc.sourceWeb of Science
dc.subjectHydrogenated Amorphous-silicon
dc.subjectA-si-h
dc.subjectDoping Efficiency
dc.subjectGermanium
dc.subjectAlloys
dc.subjectNitrogen
dc.subjectStates
dc.subjectGap
dc.titleSTRUCTURAL AND OPTOELECTRONIC PROPERTIES OF INDIUM-DOPED ALPHA-GE-H THIN-FILMS
dc.typeArtículos de revistas


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