dc.creatorCampos, CDM
dc.creatorFlacker, A
dc.creatorMoshkalev, SA
dc.creatorNobrega, EGO
dc.date2012
dc.dateMAY 31
dc.date2014-08-01T18:27:14Z
dc.date2015-11-26T17:06:49Z
dc.date2014-08-01T18:27:14Z
dc.date2015-11-26T17:06:49Z
dc.date.accessioned2018-03-28T23:55:18Z
dc.date.available2018-03-28T23:55:18Z
dc.identifierThin Solid Films. Elsevier Science Sa, v. 520, n. 15, n. 4871, n. 4874, 2012.
dc.identifier0040-6090
dc.identifierWOS:000304568300008
dc.identifier10.1016/j.tsf.2012.03.022
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/79114
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/79114
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1279960
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionThe results of an investigation of thin Ni and CoNiMnP films deposited by electroplating over polyurethane-acrylate flexible substrates are presented. To improve magnetic properties of the films, an electroplating process was carried out with assistance of a strong magnetic field (3900 G). The evaluated film properties were coercivity, remanence, maximum energy product, adherence and film composition. Comparison between the magnetic properties of the samples has shown that Ni and CoNiMnP films are suitable for distinct areas of applications in micro-devices: vibrating diaphragms and micro-magnet machines, respectively. (c) 2012 Elsevier B.V. All rights reserved.
dc.description520
dc.description15
dc.description4871
dc.description4874
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionINCT NAMITEC
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.languageen
dc.publisherElsevier Science Sa
dc.publisherLausanne
dc.publisherSuíça
dc.relationThin Solid Films
dc.relationThin Solid Films
dc.rightsfechado
dc.rightshttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dc.sourceWeb of Science
dc.subjectMagnetic properties
dc.subjectMetallic films
dc.subjectElectroplating
dc.titleComparative analysis of thin Ni and CoNiMnP magnetic films
dc.typeArtículos de revistas


Este ítem pertenece a la siguiente institución