Artículos de revistas
Influence of radiant exposure on degree of conversion, water sorption and solubility of self-etch adhesives
Registro en:
International Journal Of Adhesion And Adhesives. Elsevier Sci Ltd, v. 46, n. 40, n. 43, 2013.
0143-7496
WOS:000324976300007
10.1016/j.ijadhadh.2013.05.013
Autor
Catelan, A
Ambrosano, GMB
Lima, DANL
Marchi, GM
Aguiar, FHB
Institución
Resumen
Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) The purpose of this study was to investigate the influence of the radiant exposure on the degree of C=C conversion (DC), water sorption (WS), and solubility (S) of the Clearfil SE Bond (CSE) and Filtek LS (LS) self-etch adhesive systems. The primer of the LS (LSP), and bond agents of the CSE (CSEB) and LS (LSB) were tested. Specimens were light-cured using a light-emitting diode (LED) at different radiant exposures (6.1, 12.2, 13.9, and 27.8 J/cm(2)). DC (n=10) was measured using Fourier-transform infrared spectroscopy (FT-IR). WS and S were determined according to ISO 4049. Data were subjected to two-way ANOVA and Tukey's test at pre-set alpha of 0.05. The highest DC was exhibited by LSP, followed by CSEB and LSB, all with statistical difference (p < 0.001). The DC was increased with higher radiant exposure and extended light-curing time (p < 0.001). LSB and CSEB showed the lower WS followed by LSP, all with statistical difference (p < 0.001). CSEB and LSB presented no significance difference on the S values (p > 0.05) and were lower than LSP (p <= 0.05). The WS and S were not influenced by the different radiant exposures evaluated (p=0.9548 and p > 0.05, respectively). The monomer conversion is related to improvement on the mechanical properties of resinous material, but these properties also depend on the polymer network structure formed. (C) 2013 Elsevier Ltd. All rights reserved. 46 40 43 Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) FAPESP [2010/05666-9, 2010/15076-4]