dc.creatorINOKI, CK
dc.creatorLEMOS, V
dc.creatorCERDEIRA, F
dc.creatorVASQUEZLOPEZ, C
dc.date1993
dc.dateAPR 1
dc.date2014-12-16T11:33:33Z
dc.date2015-11-26T16:59:35Z
dc.date2014-12-16T11:33:33Z
dc.date2015-11-26T16:59:35Z
dc.date.accessioned2018-03-28T23:47:15Z
dc.date.available2018-03-28T23:47:15Z
dc.identifierJournal Of Applied Physics. Amer Inst Physics, v. 73, n. 7, n. 3266, n. 3270, 1993.
dc.identifier0021-8979
dc.identifierWOS:A1993KV03100021
dc.identifier10.1063/1.352973
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/75147
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/75147
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/75147
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1278228
dc.descriptionA series of Raman and photoreflectance measurements was performed on several InxGa1-xAs/GaAs strained-layer superlattices of the same period but of different alloy compositions and substrate orientations. In the photoreflectance spectra the photon energy region containing the E1 and E1 + DELTA1 transitions of the GaAs barrier material is analyzed. Both types of measurements are used in order to estimate of the in-plane strain in these layers. The values obtained by both methods are in good mutual agreement, thus showing that photoreflectance is an effective method for strain determination.
dc.description73
dc.description7
dc.description3266
dc.description3270
dc.languageen
dc.publisherAmer Inst Physics
dc.publisherWoodbury
dc.relationJournal Of Applied Physics
dc.relationJ. Appl. Phys.
dc.rightsaberto
dc.sourceWeb of Science
dc.subjectMultiple Quantum Wells
dc.subjectGaas
dc.subjectPhotoreflectance
dc.subjectRaman
dc.subjectSpectroscopy
dc.subjectTransitions
dc.subjectStates
dc.titleSTRAIN DETERMINATION IN INXGA1-XAS/GAAS STRAINED-LAYER SUPERLATTICES BY PHOTOMODULATED REFLECTANCE
dc.typeArtículos de revistas


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