dc.creatorSurdutovich, GI
dc.creatorKolenda, J
dc.creatorFragalli, JF
dc.creatorMisoguti, L
dc.creatorVitlina, R
dc.creatorBaranauskas, V
dc.date1996
dc.dateJUN
dc.date2014-12-16T11:32:10Z
dc.date2015-11-26T16:55:26Z
dc.date2014-12-16T11:32:10Z
dc.date2015-11-26T16:55:26Z
dc.date.accessioned2018-03-28T23:42:47Z
dc.date.available2018-03-28T23:42:47Z
dc.identifierThin Solid Films. Elsevier Science Sa Lausanne, v. 279, n. 41671, n. 119, n. 123, 1996.
dc.identifier0040-6090
dc.identifierWOS:A1996VB37200024
dc.identifier10.1016/0040-6090(95)08165-8
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/54450
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/54450
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/54450
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1277111
dc.descriptionA new method of determination of thin film anisotropy from the angular dependence of the reflectance interference patterns for s- and p-polarized light is proposed and tested experimentally. The method is based on the different phase angle dependence of polarized light on the incident angle. As a result, the interference patterns of the reflected s- and p-polarized light beams exhibit a different number of oscillations in their angular dependence. The high sensitivity of the method is shown by its application to the interference patterns of a specially prepared multilayer structure with a calculated anisotropy.
dc.description279
dc.description41671
dc.description119
dc.description123
dc.languageen
dc.publisherElsevier Science Sa Lausanne
dc.publisherLausanne 1
dc.publisherSuíça
dc.relationThin Solid Films
dc.relationThin Solid Films
dc.rightsfechado
dc.rightshttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dc.sourceWeb of Science
dc.subjectanisotropy
dc.subjectmultilayers
dc.subjectPorous Silicon
dc.subjectEllipsometry
dc.titleAn interference method for the determination of thin film anisotropy
dc.typeArtículos de revistas


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