Artículos de revistas
Solar induced chemical vapor deposition of carbon from ethanol
Registro en:
Vacuum. Pergamon-elsevier Science Ltd, v. 86, n. 12, n. 2126, n. 2128, 2012.
0042-207X
WOS:000308672000064
10.1016/j.vacuum.2012.05.037
Autor
Lunazzi, F
Peterlevitz, AC
Ceragioli, HJ
Lunazzi, JJ
Baranauskas, V
Institución
Resumen
Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) Solar induced chemical vapor deposition (S-CVD) process using the concentrated solar radiation flux provided at the focus of a Fresnel lens (diameter 40 cm, focal length 40 cm) has been investigated. Carbon deposits on silicon and on silica have been produced using ethanol as the carbon precursor, highly diluted in hydrogen. A simple optical modeling results in a spot of 0.36 cm diameter with maximum radiation flux of 0.388 kW cm(-2). The deposited spots morphology observed by Scanning Electron Microscopy (SEM) are round shaped with dimensions smaller than 500 x 500 mu m(2). Several flakes and holes of diameters around 2 mu m are easily seen on both substrates. Raman results suggest that the deposits may be composed of complex structured carbon. (C) 2012 Elsevier Ltd. All rights reserved. 86 12 2126 2128 Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)