Secondary Electron Contrast Modulation in SU-8 Photoresist Films Exposed Holographically

dc.creatorAvila, LF
dc.creatorGutierrez-Rivera, L
dc.creatorCescato, L
dc.date2010
dc.date42005
dc.date2014-11-17T16:45:52Z
dc.date2015-11-26T16:44:49Z
dc.date2014-11-17T16:45:52Z
dc.date2015-11-26T16:44:49Z
dc.date.accessioned2018-03-28T23:30:17Z
dc.date.available2018-03-28T23:30:17Z
dc.identifierJournal Of Polymer Science Part B-polymer Physics. John Wiley & Sons Inc, v. 48, n. 2, n. 226, n. 230, 2010.
dc.identifier0887-6266
dc.identifierWOS:000273581500016
dc.identifier10.1002/polb.21865
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/71276
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/71276
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/71276
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1274049
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionWe report a Secondary Electron (SE) contrast modulation observed in scanning electron microscope photographs of the cross-section of SU-8 photoresist films exposed holographically. The modulation occurs along the whole depth of the sample and its contrast disappears when the samples are submitted to the post exposure bake (PEB). Diffraction and atomic force microscopy measurements of the samples were performed before and after PEB to investigate this modulation. The results indicate that this SE emission contrast modulation comes from the spatial chemical modulation generated by the photolysis during the exposure of the SU-8 films. (C) 2009 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 48: 226-230, 2010
dc.description48
dc.description2
dc.description226
dc.description230
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.languageen
dc.publisherJohn Wiley & Sons Inc
dc.publisherHoboken
dc.publisherEUA
dc.relationJournal Of Polymer Science Part B-polymer Physics
dc.relationJ. Polym. Sci. Pt. B-Polym. Phys.
dc.rightsfechado
dc.rightshttp://olabout.wiley.com/WileyCDA/Section/id-406071.html
dc.sourceWeb of Science
dc.subjectatomic force microscopy (AFM)
dc.subjectcationic polymerization
dc.subjectholography
dc.subjectphotoresists
dc.subjectscanning electron microscopy
dc.subjectChemically Amplified Resists
dc.subjectUv-curable Epoxy
dc.subjectOptical Lithography
dc.subjectMems
dc.subjectFabrication
dc.subjectDiffusion
dc.subjectAcid
dc.subjectTopography
dc.subjectUltrathick
dc.subjectKinetics
dc.titleSecondary Electron Contrast Modulation in SU-8 Photoresist Films Exposed Holographically
dc.typeArtículos de revistas


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