AZ-1518 Photoresist analysis with synchrotron radiation using high-resolution time-of-flight mass spectrometry

dc.creatorMendes, LAV
dc.creatorPinho, RR
dc.creatorAvila, LF
dc.creatorLima, CRA
dc.creatorRocco, MLM
dc.date2007
dc.dateJUN
dc.date2014-11-17T09:41:05Z
dc.date2015-11-26T16:41:57Z
dc.date2014-11-17T09:41:05Z
dc.date2015-11-26T16:41:57Z
dc.date.accessioned2018-03-28T23:26:19Z
dc.date.available2018-03-28T23:26:19Z
dc.identifierPolymer Degradation And Stability. Elsevier Sci Ltd, v. 92, n. 6, n. 933, n. 938, 2007.
dc.identifier0141-3910
dc.identifierWOS:000247545200001
dc.identifier10.1016/j.polymdegradstab.2007.03.011
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/55259
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/55259
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/55259
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1273102
dc.descriptionWith the aim of identifying molecular modifications among photoresists unexposed and previously exposed to the ultraviolet light the photon stimulated ion desorption (PSID) technique was employed in the study of the AZ-1518 photoresist. Data acquisition was performed at the Brazilian Synchrotron Light Source (LNLS), during a single-bunch operation mode of the storage ring and using high-resolution time-of-flight mass spectrometry (TOF-MS) for ion analysis. PSID mass spectra on both photoresists (unexposed and exposed) were obtained following the SK-shell photoexcitation and desorption ion yield curves have been determined for the main fragments as a function of the photon energy. The AZ-1518 photoresists presented different PSID spectra, showing characteristic fragments. Most of the analyzed ions showed larger relative yields for the exposed photoresist. Fragments related to the photochemical decomposition of the photoresist could be clearly identified. These results showed that the PSID technique is adequate to investigate structural changes in molecular level in unexposed and exposed photoresists. (c) 2007 Elsevier Ltd. All rights reserved.
dc.description92
dc.description6
dc.description933
dc.description938
dc.languageen
dc.publisherElsevier Sci Ltd
dc.publisherOxford
dc.publisherInglaterra
dc.relationPolymer Degradation And Stability
dc.relationPolym. Degrad. Stabil.
dc.rightsfechado
dc.rightshttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dc.sourceWeb of Science
dc.subjectphotoresist
dc.subjectphotodegradation
dc.subjectphoton stimulated ion desorption
dc.subjectpositive ions
dc.subjecttime-of-flight mass spectrometry
dc.subjectStimulated Ion Desorption
dc.subjectInner-shell Excitation
dc.titleAZ-1518 Photoresist analysis with synchrotron radiation using high-resolution time-of-flight mass spectrometry
dc.typeArtículos de revistas


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