Design and Chromatic Aberration Analysis of Plasmonic Lenses Using the Finite Element Method

dc.creatorRubio-Mercedes, CE
dc.creatorRodriguez-Esquerre, VF
dc.creatorLima, IT
dc.creatorHernandez-Figueroa, HE
dc.date2013
dc.dateAPR 1
dc.date2014-07-30T14:38:47Z
dc.date2015-11-26T16:41:57Z
dc.date2014-07-30T14:38:47Z
dc.date2015-11-26T16:41:57Z
dc.date.accessioned2018-03-28T23:26:19Z
dc.date.available2018-03-28T23:26:19Z
dc.identifierJournal Of Lightwave Technology. Ieee-inst Electrical Electronics Engineers Inc, v. 31, n. 7, n. 1114, n. 1119, 2013.
dc.identifier0733-8724
dc.identifierWOS:000314960600002
dc.identifier10.1109/JLT.2013.2241732
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/61234
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/61234
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1273099
dc.descriptionCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionWe designed plasmonic lenses and analyzed their chromatic aberration using the finite element method (FEM) in frequency domain with perfectly matched layers (PML). Plasmonic lenses permit subwavelength focusing of light in the visible and in the near infrared. The focal distance of these devices depends on the wavelength operation due to the dispersive characteristics of the lens structures and the refractive index of their constituent materials. With a uniform incident wave normal to the lens surface, focusing of light by surface plasmon polariton (SPPs) through a plasmonic lens is obtained in the axial direction. The design of three plasmonic lenses in Silver (Ag), Gold (Au) and Copper (Cu) films at two central operation wavelengths of 650 nm and 810 nm, in both, cylindrical and rectangular geometries were considered and the chromatic aberration of the lenses were analyzed by monitoring the peak position of the electromagnetic (EM) field when the wavelength changes from 625 nm to 675 nm and from 785 nm to 835 nm..
dc.description31
dc.description7
dc.description1114
dc.description1119
dc.descriptionCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionOptics and Photonics Research Center (CEPOF) [05/51689-2]
dc.descriptionFapesb
dc.descriptionUFBA
dc.descriptionCoordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionCAPES [3724/10-7]
dc.descriptionCNPq [305992/2005-8, 471658/2007-3, 302390/2009-0]
dc.descriptionOptics and Photonics Research Center (CEPOF) [05/51689-2]
dc.languageen
dc.publisherIeee-inst Electrical Electronics Engineers Inc
dc.publisherPiscataway
dc.publisherEUA
dc.relationJournal Of Lightwave Technology
dc.relationJ. Lightwave Technol.
dc.rightsaberto
dc.rightshttp://www.ieee.org/publications_standards/publications/rights/rights_policies.html
dc.sourceWeb of Science
dc.subjectChromatic aberration
dc.subjectfinite element method
dc.subjectnumerical analysis
dc.subjectplasmonic lenses
dc.subjectsurface plasmon polaritons
dc.subjectBoundary-conditions
dc.titleDesign and Chromatic Aberration Analysis of Plasmonic Lenses Using the Finite Element Method
dc.typeArtículos de revistas


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