ACTIVATION OF HMDSO THIN FILMS WITH LOW PRESSURE ARGON PLASMA AND VACUUM ULTRAVIOLET RADIATION

dc.creatorGarcia-Perez, T
dc.creatorRodriguez, E
dc.creatorBittencourt, E
dc.creatorJova, Z
dc.date2012
dc.dateJAN
dc.date2014-07-30T13:43:31Z
dc.date2015-11-26T16:33:31Z
dc.date2014-07-30T13:43:31Z
dc.date2015-11-26T16:33:31Z
dc.date.accessioned2018-03-28T23:15:24Z
dc.date.available2018-03-28T23:15:24Z
dc.identifierLatin American Applied Research. Plapiqui(uns-conicet), v. 42, n. 1, n. 19, n. 25, 2012.
dc.identifier0327-0793
dc.identifierWOS:000309623700003
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/54154
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/54154
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1270879
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionPolymeric surfaces obtained by chemical vapor deposition of HMDSO on aluminum plates using plasma were modified by means of low pressure Argon plasma and vacuum ultraviolet radiation (VUV). The polymeric surface was directly exposed to the plasma -which also acted as a vacuum ultraviolet radiation source- at different conditions. An important contribution of the VUV radiation component in surface modification was observed. The surface free-energy, the chemical composition, and the morphology of the films were determined by contact angle measurement, FTIR spectroscopy, and SEM. It was observed that the action of VUV radiation inside de Argon plasma was responsible for more than 45% of the increase of surface freeenergy, and that the influence of VUV radiation on surface free-energy varied significantly as consequence of different exposure times.
dc.description42
dc.description1
dc.description19
dc.description25
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.languageen
dc.publisherPlapiqui(uns-conicet)
dc.publisherBahia Blanca
dc.publisherArgentina
dc.relationLatin American Applied Research
dc.relationLatin Am. Appl. Res.
dc.rightsfechado
dc.sourceWeb of Science
dc.subjectHexamethyldisiloxane films
dc.subjectvacuum plasma
dc.subjectvacuum ultraviolet radiation
dc.subjectsurface modification
dc.subjectAtmospheric-pressure
dc.subjectSurface Modification
dc.subjectAdhesion Enhancement
dc.subjectPolymers
dc.subjectHexamethyldisiloxane
dc.titleACTIVATION OF HMDSO THIN FILMS WITH LOW PRESSURE ARGON PLASMA AND VACUUM ULTRAVIOLET RADIATION
dc.typeArtículos de revistas


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