dc.creatorZanatta, AR
dc.creatorHammer, P
dc.creatorAlvarez, F
dc.date2000
dc.dateAPR 17
dc.date2014-12-02T16:26:43Z
dc.date2015-11-26T16:32:22Z
dc.date2014-12-02T16:26:43Z
dc.date2015-11-26T16:32:22Z
dc.date.accessioned2018-03-28T23:13:46Z
dc.date.available2018-03-28T23:13:46Z
dc.identifierApplied Physics Letters. Amer Inst Physics, v. 76, n. 16, n. 2211, n. 2213, 2000.
dc.identifier0003-6951
dc.identifierWOS:000086393600022
dc.identifier10.1063/1.126299
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/59625
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/59625
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/59625
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1270492
dc.descriptionAmorphous gallium-arsenic-nitrogen (a-GaAsN) thin films were deposited by sputtering a crystalline GaAs target with different mixtures of argon and nitrogen. X-ray photoelectron spectroscopy (XPS) and x-ray excited Auger electron spectroscopy (XAES) were employed to study the Ga and As core levels and the corresponding LMM Auger transitions of films with different N concentrations. Chemical information of these samples was obtained through the analysis of the Auger parameter, which is exempt from problems inherent in the interpretation of XPS and XAES shifts, revealing aspects associated with the composition of the a-GaAsN films. In particular, these experimental results show the preferential bonding of N to Ga atoms in the formation of N-rich amorphous GaAsN films. (C) 2000 American Institute of Physics. [S0003-6951(00)02816-3].
dc.description76
dc.description16
dc.description2211
dc.description2213
dc.languageen
dc.publisherAmer Inst Physics
dc.publisherMelville
dc.publisherEUA
dc.relationApplied Physics Letters
dc.relationAppl. Phys. Lett.
dc.rightsaberto
dc.sourceWeb of Science
dc.subjectSurfaces
dc.titlePhotoelectron spectroscopic study of amorphous GaAsN films
dc.typeArtículos de revistas


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