Optical emission end point detecting for monitoring oxygen plasma a-C : H stripping

dc.creatorAlves, MAR
dc.creatorBraga, ED
dc.creatorFissore, A
dc.creatorCescato, L
dc.date1998
dc.dateMAR
dc.date2014-12-02T16:26:18Z
dc.date2015-11-26T16:26:42Z
dc.date2014-12-02T16:26:18Z
dc.date2015-11-26T16:26:42Z
dc.date.accessioned2018-03-28T23:07:33Z
dc.date.available2018-03-28T23:07:33Z
dc.identifierVacuum. Pergamon-elsevier Science Ltd, v. 49, n. 3, n. 213, n. 215, 1998.
dc.identifier0042-207X
dc.identifierWOS:000072918100012
dc.identifier10.1016/S0042-207X(97)00139-5
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/69535
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/69535
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/69535
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1268970
dc.descriptionThe stripping of amorphous hydrogenated carbon films (a-C:H) using an rf oxygen plasma has been monitored using the optical emission from electronically excited CO, H and O species in the visible region of the spectrum. The end point has been detected by monitoring the emission intensity of O reactive species (777.2 nm) and CO emission (483.5 nm) intensity of the etching product. (C) 1998 Elsevier Science Ltd. All rights reserved.
dc.description49
dc.description3
dc.description213
dc.description215
dc.languageen
dc.publisherPergamon-elsevier Science Ltd
dc.publisherOxford
dc.publisherInglaterra
dc.relationVacuum
dc.relationVacuum
dc.rightsfechado
dc.rightshttp://www.elsevier.com/about/open-access/open-access-policies/article-posting-policy
dc.sourceWeb of Science
dc.subjectCarbon-films
dc.subjectLithography
dc.subjectHard
dc.titleOptical emission end point detecting for monitoring oxygen plasma a-C : H stripping
dc.typeArtículos de revistas


Este ítem pertenece a la siguiente institución