Poly(n-alkylsilsesquioxane)s: Synthesis, Characterization, and Modification with Poly(dimethylsiloxane)

dc.creatorDe Prado, LASA
dc.creatorTorriani, IL
dc.creatorYoshida, IVP
dc.date2010
dc.date36951
dc.date2014-11-14T12:57:19Z
dc.date2015-11-26T16:06:25Z
dc.date2014-11-14T12:57:19Z
dc.date2015-11-26T16:06:25Z
dc.date.accessioned2018-03-28T22:55:14Z
dc.date.available2018-03-28T22:55:14Z
dc.identifierJournal Of Polymer Science Part A-polymer Chemistry. John Wiley & Sons Inc, v. 48, n. 5, n. 1220, n. 1229, 2010.
dc.identifier0887-624X
dc.identifierWOS:000274942000025
dc.identifier10.1002/pola.23885
dc.identifierhttp://www.repositorio.unicamp.br/jspui/handle/REPOSIP/81399
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/81399
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/81399
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1265911
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionSelf-supported translucent films constituted of poly(n-octylsilsesquioxane) or poly(n-dodecylsilsesquioxane) were obtained from the hydrolysis and condensation of n-octyltriethoxysilane (OTES) or n-dodecyltriethoxysi lane (DTES), respectively. Dense films were obtained in the absence of organic solvents, with dibutyltin diacetate as catalyst. These films exhibited good optical transparency and thermal stability. The incorporation of oligomeric dimethylsiloxane units (D(Me,Me)) in these materials, derived from silanol-terminated poly(dimethylsiloxane) (PDMS) or 1,1,3,3-tetramethyl-1,3-diethoxydisiloxane (TMDES), was carried out during the hydrolysis and condensation of OTES and DTES and was confirmed by solid-state (29)Si NMR. Poly(n-octylsilsesquioxane) showed a glass-transition temperature at -65 degrees C, due to the increase in the free volume, promoted by the bulky n-octyl groups. The differential scanning calorimetric (DSC) curves of the polymer derived from DTES were characterized by first-order transitions at temperatures ranging from -15.8 to -0.7 degrees C. Further studies of these networks by low-temperature XRD evidenced narrowing of the diffraction halos suggesting a partial order-disorder transition for these materials at lower temperatures. Good thermal stability up to 350 degrees C and the solvent-free production process make these polymers potential candidates for the development of self-supported hydrophobic protective coatings. (C) 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 48: 1220-1229, 2010
dc.description48
dc.description5
dc.description1220
dc.description1229
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionFundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
dc.descriptionConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dc.descriptionFAPESP [03/09, 962-1]
dc.descriptionCNPq [305916/2006-8]
dc.languageen
dc.publisherJohn Wiley & Sons Inc
dc.publisherHoboken
dc.publisherEUA
dc.relationJournal Of Polymer Science Part A-polymer Chemistry
dc.relationJ. Polym. Sci. Pol. Chem.
dc.rightsfechado
dc.rightshttp://olabout.wiley.com/WileyCDA/Section/id-406071.html
dc.sourceWeb of Science
dc.subjectnetworks
dc.subjectpolycondensation
dc.subjectpolysiloxanes
dc.subjectSAXS
dc.subjectthermogravimetric analysis (TGA)
dc.subjectDiphenylsiloxane Unit Content
dc.subjectSelf-assembled Monolayers
dc.subjectCorrosion Protection
dc.subjectThermal-stability
dc.subjectPermeability Evaluation
dc.subjectProperty Relationships
dc.subjectBlock-copolymers
dc.subjectGas-permeability
dc.subjectEpoxy-resin
dc.subjectMembranes
dc.titlePoly(n-alkylsilsesquioxane)s: Synthesis, Characterization, and Modification with Poly(dimethylsiloxane)
dc.typeArtículos de revistas


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