dc.creatorAlves O.L.
dc.creatorRonconi C.M.
dc.creatorGalembeck A.
dc.date2002
dc.date2015-06-30T16:39:34Z
dc.date2015-11-26T15:31:06Z
dc.date2015-06-30T16:39:34Z
dc.date2015-11-26T15:31:06Z
dc.date.accessioned2018-03-28T22:39:33Z
dc.date.available2018-03-28T22:39:33Z
dc.identifier
dc.identifierQuimica Nova. , v. 25, n. 1, p. 69 - 77, 2002.
dc.identifier1004042
dc.identifier
dc.identifierhttp://www.scopus.com/inward/record.url?eid=2-s2.0-0036461527&partnerID=40&md5=2c8db87b750e164f95e985cabed85b7d
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/101412
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/101412
dc.identifier2-s2.0-0036461527
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1262150
dc.descriptionThis review focus the more relevant foundations and applications of the Metallo-Organic Decomposition (MOD) technique, mainly within the last decade. The technique has grown significantly, mainly due to the good results concerning the preparation of multicomponent oxide systems with composition, structural and morphologic control, in a relatively simple way. This opened new opportunities to obtain materials with well-defined electrical and optical properties.
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dc.languagept
dc.publisher
dc.relationQuimica Nova
dc.rightsaberto
dc.sourceScopus
dc.titleMetallo-organic Decomposition: A Chemical Approach To Thin Film Deposition [decomposição De Precursores Metalorgânicos: Uma Técnica Química De Obtenção De Filmes Finos]
dc.typeArtículos de revistas


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