Influence Of Photo-curing Distance On Bond Strength And Nanoleakage Of Self-etching Adhesive Bonds To Enamel And Dentin

dc.creatorPimenta De Araujo C.T.
dc.creatorPrieto L.T.
dc.creatorLima A.F.
dc.creatorSouza-Junior E.J.
dc.creatorDias C.T.S.
dc.creatorPaulillo L.A.M.S.
dc.date2014
dc.date2015-06-25T17:49:30Z
dc.date2015-11-26T15:23:12Z
dc.date2015-06-25T17:49:30Z
dc.date2015-11-26T15:23:12Z
dc.date.accessioned2018-03-28T22:32:15Z
dc.date.available2018-03-28T22:32:15Z
dc.identifier
dc.identifierActa Odontologica Scandinavica. , v. 72, n. 2, p. 113 - 119, 2014.
dc.identifier16357
dc.identifier10.3109/00016357.2013.805431
dc.identifierhttp://www.scopus.com/inward/record.url?eid=2-s2.0-84892956611&partnerID=40&md5=f8e669921894db97027caaba974523f8
dc.identifierhttp://www.repositorio.unicamp.br/handle/REPOSIP/85670
dc.identifierhttp://repositorio.unicamp.br/jspui/handle/REPOSIP/85670
dc.identifier2-s2.0-84892956611
dc.identifier.urihttp://repositorioslatinoamericanos.uchile.cl/handle/2250/1260465
dc.descriptionObjectives. To assess the influence of light-curing unit tip distance on the microtensile bond strength (μTBS) and nanoleakage of self-etching adhesives to enamel and dentin. Materials and methods. Flat buccal surfaces were prepared on 198 bovine incisors. The teeth were randomly assigned into nine groups for μTBS (n = 8) and nanoleakage (n = 3) testing according to the adhesive system (Clearfil Protect Bond, Clearfil Tri-S Bond or One Up Bond F Plus) and distance from the light-curing tip (0, 3 or 6 mm). The bonded samples were tested in tension (0.5 mm/min) and nanoleakage was analyzed using SEM. Results. Clearfil Protect Bond exhibited the highest tensile strength on both enamel and dentin. Leakage was higher in samples exposed at a distance of 6 mm on enamel and 0 mm on dentin. One Up Bond F Plus experienced the greatest amount of nanoleakage on both substrates. Conclusions. Light-curing unit distance did not influence the μTBS of the adhesives, but nanoleakage increased on enamel samples when photoactivation occurred at a distance of 6 mm. © 2014 Informa Healthcare.
dc.description72
dc.description2
dc.description113
dc.description119
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dc.languageen
dc.publisher
dc.relationActa Odontologica Scandinavica
dc.rightsfechado
dc.sourceScopus
dc.titleInfluence Of Photo-curing Distance On Bond Strength And Nanoleakage Of Self-etching Adhesive Bonds To Enamel And Dentin
dc.typeArtículos de revistas


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