The pattern structure and the scaling behavior of the surface width for two deposition models of two kinds of particles, particle A with a probability 1-P and particle C with a probability P, depositing on a (1+1)-dimensional substrate are studied. For model I, a randomlike deposition model, the pattern has a compact structure, and the surface width growth only depends on the time, W∼t1/2 for the early stage and W∼tβ(P) for the intermediate time where β is a function of P, as well as W∼P-γ for the later time. For model II, a ballisticlike deposition model, the pattern and scaling behavior are similar to the ballistic deposition. The scaling of the surface width is W∼tβ(P) for the early stage of growth and W∼Lα for the later stage. The exponent β is a function of P, while α is independent of P. © 1993 The American Physical Society.47533573361