Actas de congresos
High Q-factor Monolithic Inductor For Rf Devices Using Double Ground Shield
Registro en:
9781424419579
Proceedings Of The 7th International Caribbean Conference On Devices, Circuits And Systems, Iccdcs. , v. , n. , p. - , 2008.
10.1109/ICCDCS.2008.4542670
2-s2.0-51249117849
Autor
Lagoia Fonseca Jr. P.N.
Kretly L.C.
Institución
Resumen
This paper presents a technique to improve RF integrated inductor performance, incorporating double ground shield using polysilicon and n+ buried layer, providing a fully shield and preventing the electric field penetration. This method was compared with conventional inductors, patterned ground shield, double ground shielding using polysilicon inductors, and improves Q-factor up to 50% at 3.5, 4 and 5 GHz. The results were obtained based on AMS 0.35μm BiCMOS technology. This technique can be applied to any BiCMOS technology without any additional process. ©2008 IEEE.
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