Artículos de revistas
Poly(dimethylsiloxane) As A Pre-coating In Layer-by-layer Films Containing Phosphotungstate Nanoclusters Electrochemically Sensitive Toward S-triazines
Registro en:
Rsc Advances. Royal Society Of Chemistry, v. 4, n. 56, p. 29612 - 29621, 2014.
20462069
10.1039/c4ra01468e
2-s2.0-84904314898
Autor
Souza A.L.
Tremiliosi Filho G.
Kubota L.T.
Mendes R.K.
Botelho Do Rego A.M.
Oliveira O.N.
Henry De Villeneuve C.
Chazalviel J.N.
Allongue P.
Ozanam F.
Rodrigues Filho U.P.
Institución
Resumen
One of the major advantages of the Layer-by-Layer (LbL) deposition technique is the possible control of molecular architecture, not only to achieve optimized properties but also to seek synergy among different materials. In this study, LbL films containing nanoclusters of a Keggin type polyoxometalate, phosphotungstic acid (HPW), alternated with the polycation poly(allylamine hydrochloride) (PAH) were deposited on indium-tin oxide (ITO) substrates. The electrochemical properties of the hybrid LbL film investigated in acidic conditions indicated no significant desorption of HPW, when a layer of poly(dimethylsiloxane) terminated with 3-aminopropyl groups (PDMS) was previously deposited on the ITO substrate. Such effect occurred because PDMS prevents desorption of HPW from the hybrid film, as shown by X-ray Photoelectron Spectroscopy (XPS) analyses. 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