Artículos de revistas
Developments In Hot-filament Metal Oxide Deposition (hfmod)
Registro en:
Thin Solid Films. , v. 516, n. 5, p. 789 - 793, 2008.
406090
10.1016/j.tsf.2007.06.183
2-s2.0-36849007550
Autor
Durrant S.F.
Trasferetti B.C.
Scarminio J.
Davanzo C.U.
Rouxinol F.P.M.
Gelamo R.V.
Bica de Moraes M.A.
Institución
Resumen
Hot-filament metal oxide deposition (HFMOD) is a variant of conventional hot-filament chemical vapor deposition (HFCVD) recently developed in our laboratory and successfully used to obtain high-quality, uniform films of MOx, WOx and VOx. The method employs the controlled oxidation of a filament of a transition metal heated to 1000 °C or more in a rarefied oxygen atmosphere (typically, of about 1 Pa). Metal oxide vapor formed on the surface of the filament is transported a few centimetres to deposit on a suitable substrate. Key system parameters include the choice of filament material and diameter, the applied current and the partial pressures of oxygen in the chamber. Relatively high film deposition rates, such as 31 nm min- 1 for MoOx, are obtained. The film stoichiometry depends on the exact deposition conditions. MoOx films, for example, present a mixture of MoO2 and MoO3 phases, as revealed by XPS. As determined by Li+ intercalation using an electrochemical cell, these films also show a colouration efficiency of 19.5 cm2 C- 1 at a wavelength of 700 nm. MOx and WOx films are promising in applications involving electrochromism and characteristics of their colouring/bleaching cycles are presented. The chemical composition and structure of VOx films examined using IRRAS (infrared reflection-absorption spectroscopy), RBS (Rutherford backscattering spectrometry) and XPS (X-ray photoelectron spectrometry) are also presented. © 2007 Elsevier B.V. All rights reserved. 516 5 789 793 Somani, P.R., Radhakrishnan, S., (2002) Mater. Chem. Phys., 77, p. 117 Julien, C., Nazri, G.A., Guesdon, J.P., Gorenstein, A., Khelfa, A., Hussain, O.M., (1994) Solid State Ion., 73, p. 319 Wiesener, K., Scheider, W., Ilic, D., Steger, E., Hallmeier, K.H., Brackmann, E., (1987) J. Power Sources, 20, p. 157 Makimura, Y., Rougier, A., Tarascon, J.M., (2006) Appl. Surf. Sci., 252, p. 4593 Penin, N., Rugier, A., Laffont, L., Poizot, P., Tarascon, J.M., (2006) Sol. Energy Mater. Sol. Cells, 90, p. 422 Korosec, R.C., Bukovec, P., (2006) Acta Chim. Slov., 53, p. 136 Zayim, E.O., Tepehan, F.Z., (2004) Key Eng. Mater., 264-268, p. 435 Corbella, C., Vives, M., Pingol, A., Porqueras, I., Person, C., Bertran, E., (2003) Solid State Ion., 165, p. 15 Takasu, Y., Onoue, S., Kameyama, K., Murakami, Y., Yahikozawa, K., (1994) Electrochim. Acta, 39, p. 1993 Schiavone, L.M., Smith, W.C.D., Beni, G., Shay, J.L., (1981) J. Electrochem. Soc., 128, p. 1339 Patil, P.S., Kawar, R.K., Sadale, S.B., (2005) Appl. Surf. Sci., 249, p. 367 Aegerter, M.A., Schmitt, M., Guo, Y.P., (2002) Int. J. Photoenergy, 4, p. 1 Huang, Y.S., Zhang, Y.Z., Hu, X.F., (2002) J. Inorg. Mater., 17, p. 632 Macek, M., Orel, B., (1998) Sol. Energy Mater. Sol. Cells, 54, p. 121 Richardson, T.J., Rubin, M.D., (2001) Electrochim. Acta, 46, p. 2119 Yonghong, Y., Jiayu, Z., Peifu, G., Xu, L., Jinfa, T., (1997) Thin Solid Films, 298, p. 197 Cantão, M.P., Cisneros, J.I., Torresi, R.M., (1995) Thin Solid Films, 259, p. 70 Trasferetti, B.C., Davanzo, C.U., da Cruz, N.C., Bica de Moraes, M.A., (2000) Appl. Spectrosc., 54, p. 687 Scarmínio, J., Lourenço, A., Gorenstein, A., (1997) Thin Solid Films, 302, p. 66 Ivanova, T., Gesheva, K.A., Popkirov, G., Ganchev, M., Tzvetkova, E., (2005) Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol., 119, p. 232 Gesheva, K., Szekeres, A., Ivanova, T., (2003) Sol. Energy Mater. Sol. Cells, 76, p. 563 Yang, T.S., Ling, Z.R., Wong, M.S., (2005) Appl. Surf. Sci., 252, p. 2029 Solarska, R., Alexander, B.D., Augustynski, J., (2006) C. R. Chim., 9, p. 301 Meda, L., Breitkopf, C., Haas, T.E., Kirss, R.U., (2002) Thin Solid Films, 402, p. 126 Avellaneda, C.O., Bulhões, L.O.S., (2003) Solid State Ion., 165, p. 117 Mahan, A.H., Parilla, P.A., Jones, K.M., Dillon, A.C., (2005) Chem. Phys. Lett., 413, p. 88 Ottviano, L., Pennisi, A., Simone, F., Salvi, A.M., (2004) Opt. Mater., 27, p. 307 Surca, A., Orel, B., Drazic, G., Pihlar, B., (1999) J. Electrochem. Soc., 146, p. 232 Al-Kuhaili, M.F., Khawaja, E.E., Ingram, D.C., Durrani, S.M.A., (2004) Thin Solid Films, 460, p. 30 Bica de Moraes, M.A., Trasferetti, B.C., Rouxinol, F.P., Landers, R., Durrant, S.F., Scarmínio, J., Urbano, A., (2004) Chem. Mater., 16, p. 513 Scarmínio, J., Bica de Moraes, M.A., Dias, R.C., Rouxinol, F.P., Durrant, S.F., (2003) Electrochem. Solid-State Lett., 6, pp. H9 Berreman, D.W., (1963) Phys. Rev., 130, p. 2193