Actas de congresos
Nanosieves Fabricated By Interference Lithography And Electroforming
Registro en:
Proceedings Of Spie - The International Society For Optical Engineering. , v. 6037, n. , p. - , 2006.
0277786X
10.1117/12.637935
2-s2.0-33645234876
Autor
Gutierrez-Rivera L.E.
De Carvalho E.J.
Da Silva M.A.
Cescato L.
Institución
Resumen
Self-sustaining Nickel membranes with periodic and regular distribution of pores, in the scale of hundred of nanometers, were produced by interference lithography and electroplating. The process consists in the recording of submicrometric 2D periodic photoresist columns, on a metal-coated glass substrate, using the double exposure of an interference fringe pattern. As the photoresist is a good electrical isolator, when the sample is immersed in a Ni electroplating bath, the array of photoresist columns impedes the Nickel deposition in the patterned areas. A nickel film is then growth among the photoresist columns with a thickness up to 80 % of the height of the columns. In order to release the submicrometric membrane from the substrate, a thick hexagonal Nickel sustaining structure is electroformed, using conventional photolithography. The dimensions of the sustaining structure can be adapted in order to fulfill the pressure requirements of the filtration system. The good uniformity of the pore sizes as well as the smooth of the surface make such devices very interesting for separation of particles by size in filtration systems. 6037
Sard Ghayeni, S.B., Beatson, P.J., Fane, A.J., Schneider, R.P., Bacterial passage through microfiltration membranes in wastewater applications (1999) J. Membr. Sci., 153, pp. 71-82 (2002) Life Science Catalogue Calvo, J.I., Hernandez, A., Pradanos, P., Martinez, L., Bowen, W.R., Pore size distribution in microporous membranes, II bulk characterization of track-etched filters by air porometry and mercury prosimetry (1995) Journal of Colloid and Interface Science, 176, pp. 467-478 Han, K., Xu, W., Ruiz, A., Ruchhoeft, P., Chellam, S., Fabrication and characterization of polymeric microfiltration membranes using aperture array lithography (2005) J. Membr. Sci., 249, pp. 193-206 Kuiper, S., Van Wolferen, H., Van Rijn, C., Nijdam, W., Krijnem, G., Elwenspoek, M., Fabrication of microsieves with sub-micron pore size by laser interference lithography (2001) Journal, of Micromehcanics and Microengineering, 11, pp. 33-37 Van Rijn, C.J.M., Veldhuis, G.J., Kuiper, S., Nanosieves with microsystem tecnology for microfiltration applications (1998) Nanotechnology, 9, pp. 343-345 Kuiper, S., Boer, M.D., Van Rijn, C., Nijdarh, W., Krijnen, G., Elwenspoek, M., Wet and dry etching techniques for the release of sub-micrometre perforated membranes (2000) Journal of Micromechanics and Microengineering, 10, pp. 171-174 Gutierrez-Rivera, L.E., De Carvalho, E.J., Suva, M.A., Cescato, L., Metallic submicrometric sieves fabricated by interferometric litography and electroforming (2005) Journal of Micromechanics and Microengineering, 15, pp. 1932-1937 Griffiths, S.K., Nilson, R.H., Hruby, J.M., (1996) Modeling Electrodeposition for LIGA Microdevice Fabrication, , http://www.ca.sandia.gov/liga/process_archives.html, Sandia National Laboratories, Livermore, California Frejlich, J., Cescato, L., Mendes, G.F., Analysis of an active stabilization system for an holographic setup (1998) Appl. Opt., 27, pp. 1967-1976 Zaidi, H.S., Brueck, S.R.J., Multiple-exposure interferometric lithography (1993) J. Vac. Sci. Technol. B, 11, pp. 658-666 Mello, B.A., Costa, I.F., Lima, C.R.A., Cescato, L., Developed profile of holographically exposed photoresist gratings (1995) Applied Optics, 34, pp. 597-603 Mack, C.A., Development of positive photoresists (1987) J. Electrochem. Soc., 134, pp. 148-152 Spiro, P., (1971) Electroforming: A Comprehensive Survey of Theory, Practice and Commercial Applications 2th Edition, , Robert Draper LTD Kuiper, S., Van Rijn, C.J., Nijdam, W., Elwenspoek, M.C., Development and applications of very high flux microfiltration membranes (1998) Journal of Membrane Science, 150, pp. 1-8 www.mediacy.com