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Thin film deposition from plasmas of tetramethylsilane-helium-argon mixtures with oxygen and with nitrogen
(John Wiley & Sons IncNew YorkEUA, 1998)
Helium ion irradiation of polymer films deposited from TMS-Ar plasmas
(Wiley-Blackwell, 2007-05-23)
Polymer films synthesized from plasmas of a tetramethylsilane - Ar mixture were modified by irradiation with 170 keV He ions at fluences ranging from 1 x 10(14) to 1 x 10(16) cm(-2). As revealed by infrared spectroscopy, ...
Helium ion irradiation of polymer films deposited from TMS-Ar plasmas
(Wiley-Blackwell, 2007-05-23)
Polymer films synthesized from plasmas of a tetramethylsilane - Ar mixture were modified by irradiation with 170 keV He ions at fluences ranging from 1 x 10(14) to 1 x 10(16) cm(-2). As revealed by infrared spectroscopy, ...
Helium ion irradiation of polymer films deposited from TMS-Ar plasmas
(Wiley-Blackwell, 2014)
Helium ion irradiation of polymer films deposited from TMS-Ar plasmas
(Wiley-v C H Verlag GmbhWeinheimAlemanha, 2007)
Conventional and dynamic actinometry of glow discharges fed mixtures of tetramethylsilane, sulfur hexafluoride, and helium
(Amer Inst PhysicsWoodburyEUA, 1998)
Identification Of The Chemical Bonding Prompting Adhesion Of A-c:h Thin Films On Ferrous Alloy Intermediated By A Sicx:h Buffer Layer
(AMER CHEMICAL SOCWASHINGTON, 2015)
Characterization of PECVD a-C:H:Si:O:Cl films
(2017-07-01)
Thin films were produced by plasma enhanced chemical vapor deposition of tetramethylsilane, chloroform, and argon mixtures. The partial pressure of chloroform in the chamber feed, CCl, was varied from 0% to 40%. Amorphous ...
Characterization of Si : O : C : H films fabricated using electron emission enhanced chemical vapour deposition
(Elsevier B.V. Sa, 2008-01-15)
Silicon-based polymers and oxides may be formed when vapours of oxygen-containing organosilicone compounds are exposed to energetic electrons drawn from a hot filament by a bias potential applied to a second electrode in ...