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Effect of pressure-assisted thermal annealing on the optical properties of ZnO thin films
(2012-12-21)
ZnO thin films were prepared by the polymeric precursor method. The films were deposited on silicon substrates using the spin-coating technique, and were annealed at 330°C for 32h under pressure-assisted thermal annealing ...
Effect of pressure-assisted thermal annealing on the optical properties of ZnO thin films
(2012-12-21)
ZnO thin films were prepared by the polymeric precursor method. The films were deposited on silicon substrates using the spin-coating technique, and were annealed at 330°C for 32h under pressure-assisted thermal annealing ...
Improved photoluminescence emission and gas sensor properties of ZnO thin films
(2016-09-01)
In this article, we report a comparative study of the influence of pressure-assisted (1.72 MPa) versus ambient pressure thermal annealing on both ZnO thin films treated at 330 °C for 32 h. The effects of pressure on the ...
OPTICAL AND ELECTRICAL PROPERTIES OF ZnTe AND ZnTe: O THIN FILMS DEPOSITED BY CSVT TECHNIQUE
(2012-11-19)
Zinc Telluride (ZnTe) thin films were deposited onto glass and CdTe substrates by CSVT (Close Space Vapor Transport) technique. The analysis of the chemical compositions for the as-deposited as well as annealed ZnTe thin ...
Effect of Zn Sputtering Rate on the Morphological and Optical Properties of ZnO Films
(2013)
Zinc oxide (ZnO) and aluminum-doped zinc oxide (ZnO:Al) thin films were deposited onto glass and silicon substrates by RF magnetron sputtering using a zinc-aluminum target. Both films were deposited at a growth rate of ...
Oxidation of ZnO thin films during pulsed laser deposition process
(Bull. Mater. Sci., Vol. 36, No. 3, June 2013, pp. 385–388, 2013-06)
Abstract. Pulsed laser deposition of ZnO thin films, using KrF laser, is analysed. The films were deposited on (001) sapphire substrates at 400 ◦C, at two different oxygen pressures (0•3and 0•4 mbar) and two different target– ...
Síntese e caracterização de filmes finos de óxido de zinco
(Universidade Estadual Paulista (Unesp), 2012-02-29)
Neste trabalho filmes finos de ZnO foram depositados em substratos de vidro pela técnica de RF magnetron sputtering. Como precursores foram utilizados um alvo de zinco metálico e gás oxigênio. Duas séries de filmes finos ...
Síntese e caracterização de filmes finos de óxido de zinco
(Universidade Estadual Paulista (Unesp), 2012-02-29)
Neste trabalho filmes finos de ZnO foram depositados em substratos de vidro pela técnica de RF magnetron sputtering. Como precursores foram utilizados um alvo de zinco metálico e gás oxigênio. Duas séries de filmes finos ...