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Low-temperature deposition of silicon oxide and silicon nitride by reactive magnetron sputtering
(ELSEVIER SCI LTD, 2009)
In this study, oxide and nitride films were deposited at room temperature through the reaction of silicon Sputtered by argon and oxygen ions or argon and nitrogen ions at 250 and 350 W with 0.67 Pa pressure. It was observed ...
Study of SiC-SiAlON composite formation by nitridation of SiC-Al62.5Si mixture
(Switzerland: Trans Tech Pub., 2001, 2014)
Synthesis of SiC-SiAlON composite by nitridation of SiC-AlSi mixture
(Switzerland: Trans Tech Pub., 2001, 2014)