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Plasma deposition of amorphous carbon films from CH4 atmospheres highly diluted in Ar
(2002-11-01)
The deposition, structure and mechanical properties of hydrogenated amorphous carbon films grown in highly Ar-diluted CH4 atmospheres were investigated for a total pressure of 13 Pa. Films were investigated as a function ...
Study of GeSi:H materials deposited by PECVD at low temperatures (Td<200 °C) for device applications
(Instituto Nacional de Astrofísica, Óptica y Electrónica, 2013)
Diamond growth with CF4 addition in hot-filament chemical vapour deposition
(Chapman Hall LtdLondonInglaterra, 1997)