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FTIR and electrical characterization of a-Si:H layers deposited by PECVD at different boron ratios
(2012-11-27)
Hydrogenated amorphous silicon (a-Si:H) has found applications in flat panel displays, photovoltaic solar
cell and recently has been employed in boron doped microbolometer array.Wehave performed electrical
and structural ...
FTIR and electrical characterization of a-Si:H layers deposited by PECVD at different boron ratios
(2012-11-27)
Hydrogenated amorphous silicon (a-Si:H) has found applications in flat panel displays, photovoltaic solar
cell and recently has been employed in boron doped microbolometer array.Wehave performed electrical
and structural ...
SiOxCyHz-TiO2 Nanocomposite Films Prepared by a Novel PECVD-Sputtering Process
(ABM, ABC, ABPol, 2021-07-05)
Recently, there has been growing interest in the incorporation of particles in plasma deposited thin films to creation of multifunctional surfaces. In this work a new hybrid methodology based on the plasma enhanced chemical ...
Properties of hydrogenated amorphous carbon films deposited by PECVD and modified by SF6 plasma
(Elsevier B.V. Sa, 2011-11-15)
Hydrogenated amorphous carbon (a-C:H) films were grown at room temperature on glass and polished silicon substrates using RF-PECVD (Radio-Frequency Plasma Enhanced Chemical Vapor Deposition). Plasmas composed by 30% of ...
Controlled fluorination of a-C:F:H films by PECVD of ethylene-hexafluorobenzene mixtures
(Elsevier B.V. Sa, 2008-12-25)
Highly fluorinated plasma polymers are chemically inert,acid resistant and have low friction coefficients, thereby being useful in chemical laboratories and for tribological applications. Here we report the plasma ...
Properties of hydrogenated amorphous carbon films deposited by PECVD and modified by SF6 plasma
(Elsevier B.V. Sa, 2011-11-15)
Hydrogenated amorphous carbon (a-C:H) films were grown at room temperature on glass and polished silicon substrates using RF-PECVD (Radio-Frequency Plasma Enhanced Chemical Vapor Deposition). Plasmas composed by 30% of ...
Controlled fluorination of a-C:F:H films by PECVD of ethylene-hexafluorobenzene mixtures
(Elsevier B.V. Sa, 2008-12-25)
Highly fluorinated plasma polymers are chemically inert,acid resistant and have low friction coefficients, thereby being useful in chemical laboratories and for tribological applications. Here we report the plasma ...
Controlled fluorination of a-C:F:H films by PECVD of ethylene-hexafluorobenzene mixtures
(Elsevier B.V. Sa, 2014)