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Plasma deposition of amorphous carbon films from CH4 atmospheres highly diluted in Ar
(2002-11-01)
The deposition, structure and mechanical properties of hydrogenated amorphous carbon films grown in highly Ar-diluted CH4 atmospheres were investigated for a total pressure of 13 Pa. Films were investigated as a function ...
Influence of hydrogen on the thermomechanical properties of a-CNx : H and a-CNx films deposited by glow discharge and ion beam assisted deposition
(Elsevier Science BvAmsterdamHolanda, 2006)
The protective effect of thin amorphous hydrogenated carbon a-C : H films during metallisation of metal-carbon-oxide-silicon (MCOS) diodes
(Elsevier Advanced TechnologyOxfordInglaterra, 2003)
Fabrication of silicon field-emission arrays using masks of amorphous hydrogenated carbon films
(Elsevier Sci LtdOxfordInglaterra, 2007)
Optoelectronic and structural properties of a-Ge1-xCx : H prepared by rf reactive cosputtering
(Amer Inst PhysicsWoodburyEUA, 1998)
Growth of nitrogenated fullerene-like carbon on Ni islands by ion beam sputtering
(Pergamon-elsevier Science LtdOxfordInglaterra, 2007)
Resistivity humidity sensors based on hydrogenated amorphous carbon films
(IOP Publishing, 2019-02)
We have studied the humidity dependence of the electrical properties in hydrogenated amorphous carbon (a-C:H) films. The films were prepared in two stages combining the techniques of physical deposition in vapor phase ...
Permittivity of amorphous hydrogenated carbon (alpha-C : H) films as a function of thermal annealing
(Elsevier Advanced TechnologyOxfordInglaterra, 2001)
Amorphous hydrogenated carbon films used as masks for silicon microtips fabrication in a reactive ion etching with SF6 plasma
(Pergamon-elsevier Science LtdOxfordInglaterra, 2004)